On the stability of glycine-water clusters with excess electron: Implications for photoelectron spectroscopy

2005 ◽  
Vol 122 (8) ◽  
pp. 084310 ◽  
Author(s):  
Doo-Sik Ahn ◽  
Ae-Ri Kang ◽  
Sungyul Lee ◽  
Bongsoo Kim ◽  
Sang Kyu Kim ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Water Clusters ◽  
Excess Electron ◽  
The Stability

Interactions of Ge Atoms with High- ê Oxide Dielectric Surfaces

2005 ◽  
Vol 879 ◽  
Author(s):  
Scott K. Stanley ◽  
John G. Ekerdt
Keyword(s):  
Oxide Layer ◽  
Photoelectron Spectroscopy ◽  
Chemical Vapor ◽  
Temperature Programmed Desorption ◽  
Tungsten Filament ◽  
X Ray ◽  
Dielectric Surfaces ◽  
Temperature Programmed ◽  
The Stability ◽  
Ge Nanocrystals

AbstractGe is deposited on HfO2 surfaces by chemical vapor deposition (CVD) with GeH4. 0.7-1.0 ML GeHx (x = 0-3) is deposited by thermally cracking GeH4 on a hot tungsten filament. Ge oxidation and bonding are studied at 300-1000 K with X-ray photoelectron spectroscopy (XPS). Ge, GeH, GeO, and GeO2 desorption are measured with temperature programmed desorption (TPD) at 400-1000 K. Ge initially reacts with the dielectric forming an oxide layer followed by Ge deposition and formation of nanocrystals in CVD at 870 K. 0.7-1.0 ML GeHx deposited by cracking rapidly forms a contacting oxide layer on HfO2 that is stable from 300-800 K. Ge is fully removed from the HfO2 surface after annealing to 1000 K. These results help explain the stability of Ge nanocrystals in contact with HfO2.

Interaction of Gold Atom with Clusters of Water: Few Computational Mise-En-Scènes with Hydrogen Bonding Motif

2008 ◽  
Vol 73 (11) ◽  
pp. 1457-1474 ◽  
Author(s):  
Eugene S. Kryachko
Keyword(s):  
Hydrogen Bond ◽  
Hydrogen Bonding ◽  
Computational Model ◽  
Photoelectron Spectroscopy ◽  
Water Clusters ◽  
Gold Atom ◽  
Proton Acceptor ◽  
Anion Photoelectron Spectroscopy ◽  
Relationship Of ◽  
First Time

The present work outlines the fair relationship of the computational model with the experiments on anion photoelectron spectroscopy for the gold-water complexes [Au(H2O)1≤n≤2]- that is established between the auride anion Au- and water monomer and dimer thanks to the nonconventional hydrogen bond where Au- casts as the nonconventional proton acceptor. This work also extends the computational model to the larger complexes [Au(H2O)3≤n≤5]- where gold considerably thwarts the shape of water clusters and even particularly breaks their conventional hydrogen bonding patterns. The fascinating phenomenon of the lavish proton acceptor character of Au- to form at least six hydrogen bonds with molecules of water is computationally unveiled in the present work for the first time.

Water Binding Stabilizes Stacked Conformations of Ferrocene Containing Sheet-like Aromatic Oligoamides

2021 ◽  
Author(s):  
Ya-zhou Liu ◽  
Xiao Mu ◽  
Chieh-Kai Chan ◽  
Koen Robeyns ◽  
Cheng-Chung Wang ◽  
...  
Keyword(s):  
Essential Role ◽  
Water Clusters ◽  
Water Binding ◽  
Biological Structures ◽  
The Stability

While water clusters play an essential role in the stability of biological structures, their ability to stabilize synthetic oligomers is less understood. We have synthesized a heptameric sheet-like aromatic oligoamide...

scholarly journals An estimation on the mechanical stabilities of SAMs by low energy Ar+ cluster ion collision

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Y. Tong ◽  
G. R. Berdiyorov ◽  
A. Sinopoli ◽  
M. E. Madjet ◽  
V. A. Esaulov ◽  
...  
Keyword(s):  
Electron Irradiation ◽  
Photoelectron Spectroscopy ◽  
Density Functional ◽  
Crystal Surface ◽  
Depth Profiling ◽  
Low Energy ◽  
Cross Linking ◽  
Xps Spectra ◽  
Self Assembled ◽  
The Stability

AbstractThe stability of the molecular self-assembled monolayers (SAMs) is of vital importance to the performance of the molecular electronics and their integration to the future electronics devices. Here we study the effect of electron irradiation-induced cross-linking on the stability of self-assembled monolayer of aromatic 5,5′-bis(mercaptomethyl)-2,2′-bipyridine [BPD; HS-CH2-(C5H3N)2-CH2-SH] on Au (111) single crystal surface. As a refence, we also study the properties of SAMs of electron saturated 1-dodecanethiol [C12; CH3-(CH2)11-SH] molecules. The stability of the considered SAMs before and after electron-irradiation is studied using low energy Ar+ cluster depth profiling monitored by recording the X-ray photoelectron spectroscopy (XPS) core level spectra and the UV-photoelectron spectroscopy (UPS) in the valance band range. The results indicate a stronger mechanical stability of BPD SAMs than the C12 SAMs. The stability of BPD SAMs enhances further after electron irradiation due to intermolecular cross-linking, whereas the electron irradiation results in deterioration of C12 molecules due to the saturated nature of the molecules. The depth profiling time of the cross-linked BPD SAM is more than 4 and 8 times longer than the profiling time obtained for pristine and BPD and C12 SAMs, respectively. The UPS results are supported by density functional theory calculations, which show qualitative agreement with the experiment and enable us to interpret the features in the XPS spectra during the etching process for structural characterization. The obtained results offer helpful options to estimate the structural stability of SAMs which is a key factor for the fabrication of molecular devices.

CVD Boron Carbo-Nitride as Pore Sealant for Ultra Low-K Interlayer Dielectrics

2005 ◽  
Vol 863 ◽  
Author(s):  
P. Ryan Fitzpatrick ◽  
Sri Satyanarayana ◽  
Yangming Sun ◽  
John M. White ◽  
John G. Ekerdt
Keyword(s):  
Photoelectron Spectroscopy ◽  
Depth Profiling ◽  
Chemical Vapor ◽  
K Value ◽  
X Ray ◽  
Dimethylamine Borane ◽  
The Stability ◽  
Low K ◽  
Secondary Ion ◽  
Sims Depth Profiling

AbstractBlanket porous methyl silsesquioxane (pMSQ) films on a Si substrate were studied with the intent to seal the pores and prevent penetration of a metallic precursor during barrier deposition. The blanket pMSQ films studied were approximately 220 nm thick and had been etched and ashed. When tantalum pentafluoride (TaF5) is exposed to an unsealed pMSQ sample, X-ray photoelectron spectroscopy (XPS) depth profiling and secondary ion mass spectroscopy (SIMS) depth profiling reveal penetration of Ta into the pores all the way to the pMSQ / Si interface. Boron carbo-nitride films were grown by thermal chemical vapor deposition (CVD) using dimethylamine borane (DMAB) precursor with Ar carrier gas and C2H4 coreactant. These films had a stoichiometry of BC0.9N0.07 and have been shown in a previous study to have a k value as low as 3.8. BC0.9N0.07 films ranging from 1.8 to 40.6 nm were deposited on pMSQ and then exposed to TaF5 gas to determine the extent of Ta penetration into the pMSQ. Ta penetration was determined by XPS depth profiling and sometimes SIMS depth profiling. XPS depth profiling of a TaF5 / 6.3 nm BC0.9N0.07 / pMSQ / Si film stack indicates the attenuation of the Ta signal to < 2 at. % throughout the pMSQ. Backside SIMS of this sample suggests that trace amounts of Ta (< 2 at. %) are due to knock-in by Ar ions used for sputtering. An identical film stack containing 3.9 nm BC0.9N0.07 was also successful at inhibiting Ta penetration even with a 370°C post-TaF5 exposure anneal, suggesting the stability of BC0.9N0.07 to thermal diffusion of Ta. All BC0.9N0.07 films thicker than and including 3.9 nm prevented Ta from penetrating into the pMSQ.

scholarly journals Plasma-Stimulated Super-Hydrophilic Surface Finish of Polymers

Polymers ◽  
2020 ◽  
Vol 12 (11) ◽  
pp. 2498 ◽  
Author(s):  
Miran Mozetič
Keyword(s):  
Surface Finish ◽  
Photoelectron Spectroscopy ◽  
Oxygen Plasma ◽  
Polymer Materials ◽  
Oxygen Plasma Treatment ◽  
Hydrophilic Surface ◽  
Capacitively Coupled ◽  
Force Microscopy ◽  
The Stability ◽  
Micrometer Scale

Super-hydrophilicity is a desired but rarely reported surface finish of polymer materials, so the methods for achieving such a property represent a great scientific and technological challenge. The methods reported by various authors are reviewed and discussed in this paper. The super-hydrophilic surface finish has been reported for polymers functionalized with oxygen-rich surface functional groups and of rich morphology on the sub-micrometer scale. The oxygen concentration as probed by X-ray photoelectron spectroscopy should be above 30 atomic % and the roughness as determined by atomic force microscopy over a few nm, although most authors reported the roughness was close to 100 nm. A simple one-step oxygen plasma treatment assures for super-hydrophilicity of few polymers only, but the technology enables such a surface finish of almost any fluorine-free polymer providing a capacitively coupled oxygen plasma that enables deposition of minute quantities of inorganic material is applied. More complex methods include deposition of at least one coating, followed by surface activation with oxygen plasma. Fluorinated polymers require treatment with plasma rich in hydrogen to achieve the super-hydrophilic surface finish. The stability upon aging depends largely on the technique used for super-hydrophilization.

Ta2O5-Incorporated WO3 Nanocomposite Film for Improved Electrochromic Performance in an Acidic Condition

2006 ◽  
Vol 6 (11) ◽  
pp. 3572-3576 ◽  
Author(s):  
Hee-Sang Shim ◽  
Hyo-Jin Ahn ◽  
Youn-Su Kim ◽  
Yung-Eun Sung ◽  
Won Bae Kim
Keyword(s):  
Surface Roughness ◽  
Photoelectron Spectroscopy ◽  
Potential Cycling ◽  
Force Microscopy ◽  
Atomic Force ◽  
Transmission Electron ◽  
Continuous Potential ◽  
Chemical States ◽  
The Stability

We report electrochromic and electrochemical properties of a WO3-Ta2O5 nanocomposite electrode that was fabricated from co-sputtering. Transmission electron microscopy (TEM)images of the WO3-Ta2O5 nanocomposite electrode revealed that morphology of the WO3 film was changed by incorporation of Ta2O5 nanoparticles, and their chemical states were confirmed to be W6+ and Ta5+ oxides from X-ray photoelectron spectroscopy (XPS). The introduction of Ta2O5 to the WO3 film played a role in alleviating surface roughness increase during continuous potential cycling; whereas the surface roughness of the WO3 film was increased from ca. 3.0 nm to ca. 13.4 nm after 400 cycles, the roughness increase on the WO3-Ta2O5 was significantly reduced to 4.2 nm after 400 cycles, as investigated by atomic force microscopy (AFM). This improvement of the stability by adding Ta2O5 may be responsible for the enhanced electrochemical and optical properties over long-term cycling with the WO3-Ta2O5 nanocomposite electrode.

Instability of Si3N4/, SiC/, and MoSi2/ethanol suspensions

2003 ◽  
Vol 18 (1) ◽  
pp. 45-52 ◽  
Author(s):  
Yoko Fukada ◽  
Patrick S. Nicholson
Keyword(s):  
Photoelectron Spectroscopy ◽  
Inductively Coupled Plasma ◽  
Ammonium Hydroxide ◽  
Inductively Coupled ◽  
Transmission Electron ◽  
Tetramethyl Ammonium Hydroxide ◽  
Powder Addition ◽  
The Stability ◽  
Insight Into

Time-dependent suspension behavior is reported for nonoxide ceramic powders (Si3N4, SiC, and MoSi2) in ethanol. The suspension pH (and therefore the stability) changed with time. X-ray photoelectron spectroscopy, inert gas fusion, inductively coupled plasma, and high-resolution transmission electron microscopy were used to track changes of surface chemistry. The adsorption of the base, tetramethyl ammonium hydroxide (TMAH), is examined. The pH drop on powder addition to pure EtOH was used to gain insight into the role of TMAH coverage of the powder surfaces.

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