High-pressure, high-temperature x-ray absorption fine structure transmission cell for the study of aqueous ions with low absorption-edge energies

2004 ◽  
Vol 75 (12) ◽  
pp. 5228-5231 ◽  
Author(s):  
John L. Fulton ◽  
Yongsheng Chen ◽  
Steve M. Heald ◽  
Mahalingam Balasubramanian
Keyword(s):  
High Pressure ◽  
Fine Structure ◽  
High Temperature ◽  
Absorption Edge ◽  
X Ray ◽  
Absorption Fine ◽  
High Pressure High Temperature ◽  
Aqueous Ions ◽  
X Ray Absorption

scholarly journals Design of a high-temperature and high-pressure liquid flow cell for x-ray absorption fine structure measurements under catalytic reaction conditions

2008 ◽  
Vol 79 (1) ◽  
pp. 014101 ◽  
Author(s):  
Toshihide Kawai ◽  
Wang-Jae Chun ◽  
Kiyotaka Asakura ◽  
Yuichiro Koike ◽  
Masaharu Nomura ◽  
...  
Keyword(s):  
High Pressure ◽  
Fine Structure ◽  
High Temperature ◽  
Liquid Flow ◽  
Catalytic Reaction ◽  
Flow Cell ◽  
Reaction Conditions ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption

Extended x-ray-absorption fine-structure study of copper under high pressure

1989 ◽  
Vol 39 (17) ◽  
pp. 12537-12547 ◽  
Author(s):  
J. Freund ◽  
R. Ingalls ◽  
E. D. Crozier
Keyword(s):  
High Pressure ◽  
Fine Structure ◽  
Structure Study ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption

XAFS Study of Molten ZrCl4 in LiCl-KCl Eutectic

2002 ◽  
Vol 57 (5) ◽  
pp. 277-280 ◽  
Author(s):  
Yoshihiro Okamoto ◽  
Haruhiko Motohashi
Keyword(s):  
Fine Structure ◽  
Coordination Number ◽  
Curve Fitting ◽  
Absorption Edge ◽  
Local Structure ◽  
Molten Mixture ◽  
X Ray ◽  
Absorption Fine ◽  
Curve Fitting Analysis ◽  
X Ray Absorption

The local structure of motlen ZrCl4 in LiCl-KCl eutectic was investigated by using an X-ray absorption fine structure (XAFS) of the Zr K-absorption edge. The nearest Zr4+-Cl- distance and coordination number from the curve fitting analysis were (2.51±0.02) Å and 5.9±0.6, respectively. These suggest that a 6-fold coordination (ZrCl6)2- is predominant in the molten mixture.

A high pressure La K-edge X-ray absorption fine structure spectroscopy investigation of La1/3NbO3

2017 ◽  
Vol 38 (1) ◽  
pp. 12-22 ◽  
Author(s):  
C. Marini ◽  
B. Joseph ◽  
O. Noked ◽  
R. Shuker ◽  
B. J. Kennedy ◽  
...  
Keyword(s):  
High Pressure ◽  
Fine Structure ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption

Metal incorporation in sputter-deposited MoS2 films studied by extended x-ray absorption fine structure

1995 ◽  
Vol 10 (8) ◽  
pp. 2091-2105 ◽  
Author(s):  
Jeffrey R. Lince ◽  
Michael R. Hilton ◽  
Arun S. Bommannavar
Keyword(s):  
Fine Structure ◽  
Absorption Edge ◽  
Electrical Contacts ◽  
Range Order ◽  
X Ray ◽  
Absorption Fine ◽  
Ni Content ◽  
Crystalline Films ◽  
Sputter Deposited ◽  
X Ray Absorption

Solid lubricant films produced by cosputtering metals with MoS2 and by forming metal/MoS2 multilayers are being planned for use in the next generation of solid lubricated devices on spacecraft, including gimbal and sensor bearings, actuators, and sliding electrical contacts. The films exhibit increased densities and wear lives compared to films without additives, but the mechanism of density enhancement is not well understood. The extended x-ray absorption fine structure (EXAFS) technique is ideal for elucidating the structure of these poorly crystalline films. We analyzed MoS2 films cosputtered with 0, 2, and 10% Ni, as well as Ni/MoS2 and Au(Pd)/MoS2 multilayer films. The results obtained at the Mo-K absorption edge showed that the metal-containing films comprised predominantly the same nanocrystalline phases present in similar films without added metals: pure MoS2 and a MoS2−xOx phase. MoS2−xOx is isostructural with MoS2, with O atoms substituting for S atoms in the MoS2 crystal lattice. For all Ni-containing films, EXAFS data obtained at the Ni-K absorption edge showed that the Ni had not chemically reacted with the MoS2−xOx and MoS2, but formed a disordered NiOx phase. However, Ni-cosputtered films showed decreasing Mo-Mo bond lengths in the MoS2−xOx phase with increasing Ni content, probably due to preferential oxidation of Ni compared to MoS2. EXAFS of these Ni-cosputtcred films showed only a small decrease in short-range order with Ni content, while x-ray diffraction showed a concurrent large decrease in long-range order. The results indicate that film densification in Ni-cosputtered films is caused by NiOx formation at the edges of nucleating MoS2−xOx/MoS2 crystallites, limiting the crystallite size attainable within the films.

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