Kink effect in short-channel polycrystalline silicon thin-film transistors

2004 ◽  
Vol 85 (15) ◽  
pp. 3113-3115 ◽  
Author(s):  
A. Valletta ◽  
P. Gaucci ◽  
L. Mariucci ◽  
G. Fortunato ◽  
S. D. Brotherton
1992 ◽  
Vol 258 ◽  
Author(s):  
G. Fortunato ◽  
L. Mariucci ◽  
A. Mattacchini ◽  
A. Pecora

ABSTRACTAn avalanche increase of the drain current for high source-drain voltage (commonly called “kink effect”) has been observed for the first time in short-channel amorphous silicon thin-film transistors, fabricated using electron-beam lithography. This effect, caused by generation mechanisms at the drain junction, has been shown to be not only field but also temperature enhanced. The Frenkel-Poole mechanism is proposed in order to explain the data.


2006 ◽  
Vol 100 (11) ◽  
pp. 114507 ◽  
Author(s):  
Genshiro Kawachi ◽  
Shinzo Tsuboi ◽  
Takashi Okada ◽  
Masahiro Mitani ◽  
Masakiyo Matsumura

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