Effects of Ti–W codoping on the optical and electrical switching of vanadium dioxide thin films grown by a reactive pulsed laser deposition

2004 ◽  
Vol 85 (11) ◽  
pp. 1958-1960 ◽  
Author(s):  
M. Soltani ◽  
M. Chaker ◽  
E. Haddad ◽  
R. V. Kruzelecky ◽  
J. Margot
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Vanadium Dioxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Electrical Switching ◽  
Vanadium Dioxide Thin Films

Phase-selective vanadium dioxide (VO2) nanostructured thin films by pulsed laser deposition

2015 ◽  
Vol 118 (16) ◽  
pp. 165308 ◽  
Author(s):  
B. N. Masina ◽  
S. Lafane ◽  
L. Wu ◽  
A. A. Akande ◽  
B. Mwakikunga ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Vanadium Dioxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Nanostructured Thin Films

Influence of C-implanted ions on the transition properties of VO2 thin films

MRS Advances ◽  
2020 ◽  
Vol 5 (40-41) ◽  
pp. 2139-2146
Author(s):  
B. M. Mabakachaba ◽  
I. G. Madiba ◽  
B.S. Khanyile ◽  
C.J. Arendse ◽  
J. Kennedy ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Vanadium Dioxide ◽  
Elevated Temperatures ◽  
Ion Beam ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
The Novel ◽  
Vo2 Thin Films ◽  
Vanadium Dioxide Thin Films

AbstractThe study report on Vanadium dioxide thin films of about 100nm thickness deposited using pulsed laser deposition on Si (100). The novel phase change reported is attributed to the post-treatment of the films via ion implantation with 25 KeV C+ ion beam at varying particle fluence (1E15, 1E16, and 1E17 /cm2). At the initial fluence, the preferred phase is retained while amorphization and recrystallization of the film is observed as the fluence increase to 1E16 ions/cm2and 1E17 ions/cm2, respectively. The phase transition of the samples is observed to occur at a temperature below 320 K while stabilization of the low phase structure is observed for the middle fluence. Further increase restores the SMT behaviour/trend that occurred at elevated temperatures.

Pulsed laser deposition of PbMg1/3Nb2/3O3 thin films and PbMg1/3Nb2/3O3/PbTiO3 multilayers

2001 ◽  
Vol 11 (PR11) ◽  
pp. Pr11-65-Pr11-69
Author(s):  
N. Lemée ◽  
H. Bouyanfif ◽  
J. L. Dellis ◽  
M. El Marssi ◽  
M. G. Karkut ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

SrBi2Nb2O9 ferroelectric thin films deposited by pulsed laser deposition on textured and epitaxied platinum electrodes

2001 ◽  
Vol 11 (PR11) ◽  
pp. Pr11-133-Pr11-137
Author(s):  
J. R. Duclère ◽  
M. Guilloux-Viry ◽  
A. Perrin ◽  
A. Dauscher ◽  
S. Weber ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Ferroelectric Thin Films ◽  
Laser Deposition ◽  
Platinum Electrodes
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