Development of multicathode high flux metal ion plasma sources in Korea

2004 ◽  
Vol 75 (9) ◽  
pp. 3068-3070
Author(s):  
Do-Yun Kim ◽  
Eui-Wan Lee ◽  
Myoung-Bok Lee
2018 ◽  
Vol 20 (8) ◽  
pp. 085403 ◽  
Author(s):  
Jia TIAN ◽  
Wenzheng LIU ◽  
Weisheng CUI ◽  
Yongjie GAO

2021 ◽  
pp. 202-231
Author(s):  
Alinka Vesel ◽  
Miran Mozetic ◽  
A. Ricard

1988 ◽  
Vol 59 (8) ◽  
pp. 1369-1375 ◽  
Author(s):  
D. P. Sheehan ◽  
N. Rynn

2020 ◽  
Vol 62 (3) ◽  
pp. 035012 ◽  
Author(s):  
Jia Tian ◽  
Wenzheng Liu ◽  
Yongjie Gao ◽  
Wenjun Zhang ◽  
Luxiang Zhao

Author(s):  
I. A. Ivanov ◽  
A. G. Slutsky ◽  
V. A. Sheinert ◽  
E. V. Kovalevich ◽  
V. N. Khlebtsevich

The coatings based on silicides of various metals are widely used in various industries by vacuum-plasma processes for products treatment. The quality of such coatings is determined by the degree of chemical purity of the target cathode, the correct choice of a mixture of process gases and the level of accelerating potential supplied to the substrate. Traditional methods for producing multi-component targets have a number of disadvantages, such as: high residual porosity, excess content of impurities, as well as the need for expensive equipment.The use of casting technologies in the production of target cathodes is promising. The paper presents the generalized results of experimental studies of manufacturing target cathodes for vacuum ion-plasma sources by methods of reduction and high-speed induction melting. Silicides of titanium, copper and nickel were used as the material.


Sign in / Sign up

Export Citation Format

Share Document