scholarly journals Optical properties of SiOx nanostructured films by pulsed-laser deposition at different substrate temperatures

2004 ◽  
Vol 96 (6) ◽  
pp. 3180-3186 ◽  
Author(s):  
X. Y. Chen ◽  
Y. F. Lu ◽  
Y. H. Wu ◽  
B. J. Cho ◽  
W. D. Song ◽  
...  
Keyword(s):  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Nanostructured Films ◽  
Substrate Temperatures

Characteristics of ultraviolet-assisted pulsed-laser-deposited Y2O3 thin films

2000 ◽  
Vol 15 (2) ◽  
pp. 488-494 ◽  
Author(s):  
V. Craciun ◽  
E. S. Lambers ◽  
N. D. Bassim ◽  
R. K. Singh ◽  
D. Craciun
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Structural And Optical Properties ◽  
Uv Illumination ◽  
Substrate Temperatures

The properties of thin Y2O3 films grown using an in situ ultraviolet (UV)-assisted pulsed laser deposition (PLD) technique were studied. With respect to Y2O3 films grown by conventional PLD under similar conditions but without UV illumination, the UVPLD-grown films exhibited better structural and optical properties, especially for lower substrate temperatures, from 340 to 400 °C. These layers were highly crystalline and textured along the (111) direction, and their refractive index values were similar to those of reference Y2O3 layers. They also exhibited a better stoichiometry and contained less physisorbed oxygen than the conventional PLD-grown layers.

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