Optical properties of nanocrystalline silicon within silica gel monoliths

2004 ◽  
Vol 96 (4) ◽  
pp. 2240-2243 ◽  
Author(s):  
Y. Posada ◽  
L. San Miguel ◽  
L. F. Fonseca ◽  
O. Resto ◽  
S. Z. Weisz ◽  
...  
1994 ◽  
Vol 176 (2-3) ◽  
pp. 172-178 ◽  
Author(s):  
A Boos ◽  
G Pourroy ◽  
J.L Rehspringer ◽  
J.L Guille

2012 ◽  
Vol 2012 ◽  
pp. 1-5 ◽  
Author(s):  
S. Ktifa ◽  
M. Ghrib ◽  
F. Saadallah ◽  
H. Ezzaouia ◽  
N. Yacoubi

We have studied the optical properties of nanocrystalline silicon (nc-Si) film deposited by plasma enhancement chemical vapor deposition (PECVD) on porous aluminum structure using, respectively, the Photothermal Deflection Spectroscopy (PDS) and Photoluminescence (PL). The aim of this work is to investigate the influence of anodisation current on the optical properties of the porous aluminum silicon layers (PASL). The morphology characterization studied by atomic force microscopy (AFM) technique has shown that the grain size of (nc-Si) increases with the anodisation current. However, a band gap shift of the energy gap was observed.


1996 ◽  
Vol 90 (2) ◽  
pp. 461-468 ◽  
Author(s):  
J. Legendziewicz ◽  
W. Stręk ◽  
J. Sokolnicki ◽  
B. Keller ◽  
M. Borzechowska

Vacuum ◽  
2012 ◽  
Vol 86 (8) ◽  
pp. 1195-1202 ◽  
Author(s):  
Goh Boon Tong ◽  
Zarina Aspanut ◽  
Muhamad Rasat Muhamad ◽  
Saadah Abdul Rahman

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