Arc Ion Source with Direct‐Current Filament Supply for 60‐Inch Cyclotron

1945 ◽  
Vol 16 (8) ◽  
pp. 224-225 ◽  
Author(s):  
D. B. Cowie ◽  
C. J. Ksanda
Keyword(s):  
Direct Current ◽  
Ion Source ◽  
Current Filament

A direct current polarized H− ion source based on optically pumped rubidium

1992 ◽  
Vol 63 (4) ◽  
pp. 2625-2627 ◽  
Author(s):  
C. D. P. Levy ◽  
L. Buchmann ◽  
K. Jayamanna ◽  
M. McDonald ◽  
R. Ruegg ◽  
...  
Keyword(s):  
Direct Current ◽  
Ion Source ◽  
Optically Pumped

Advanced direct current negative-ion source for accelerator use

2006 ◽  
Vol 77 (3) ◽  
pp. 03A527 ◽  
Author(s):  
Yu. Belchenko ◽  
I. Gusev ◽  
A. Khilchenko ◽  
A. Kvashnin ◽  
V. Rashchenko ◽  
...  
Keyword(s):  
Direct Current ◽  
Ion Source ◽  
Negative Ion

The drift source: A negative ion source module for direct current multiampere ion beams

1999 ◽  
Vol 70 (12) ◽  
pp. 4542-4544 ◽  
Author(s):  
A. Simonin ◽  
G. Delogu ◽  
C. Desgranges ◽  
M. Fumelli
Keyword(s):  
Direct Current ◽  
Ion Beams ◽  
Ion Source ◽  
Negative Ion

Investigation of helium ion production in constricted direct current plasma ion source with layered-glows

2014 ◽  
Vol 85 (2) ◽  
pp. 02C105
Author(s):  
Yuna Lee ◽  
Kyoung-Jae Chung ◽  
Yeong-Shin Park ◽  
Y. S. Hwang
Keyword(s):  
Direct Current ◽  
Ion Source ◽  
Direct Current Plasma ◽  
Helium Ion ◽  
Ion Production ◽  
Plasma Ion Source

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Aspects of high-resolution imaging with a scanning ion microprobe

1986 ◽  
Vol 44 ◽  
pp. 750-751
Author(s):  
R. Levi-Setti ◽  
J. M. Chabala ◽  
Y. L. Wang
Keyword(s):  
Metal Ion ◽  
Secondary Ion Mass Spectrometry ◽  
Chromatic Aberration ◽  
Ion Source ◽  
Ion Microprobe ◽  
Emission Pattern ◽  
Intrinsic Resolution ◽  
Resolution Imaging ◽  
20 Nm ◽  
Secondary Ion

We have shown the feasibility of 20 nm lateral resolution in both topographic and elemental imaging using probes of this size from a liquid metal ion source (LMIS) scanning ion microprobe (SIM). This performance, which approaches the intrinsic resolution limits of secondary ion mass spectrometry (SIMS), was attained by limiting the size of the beam defining aperture (5μm) to subtend a semiangle at the source of 0.16 mr. The ensuing probe current, in our chromatic-aberration limited optical system, was 1.6 pA with Ga+ or In+ sources. Although unique applications of such low current probes have been demonstrated,) the stringent alignment requirements which they imposed made their routine use impractical. For instance, the occasional tendency of the LMIS to shift its emission pattern caused severe misalignment problems.

Inter-Method Reliability of Pulse Volume Related Measures Derived Using Finger-Photoplethysmography

2018 ◽  
Vol 32 (4) ◽  
pp. 182-190 ◽  
Author(s):  
Kenta Matsumura ◽  
Koichi Shimizu ◽  
Peter Rolfe ◽  
Masanori Kakimoto ◽  
Takehiro Yamakoshi
Keyword(s):  
Light Intensity ◽  
Adverse Effects ◽  
Light Source ◽  
Direct Current ◽  
Resting State ◽  
Current Component ◽  
Psychophysiological Measures ◽  
Pulse Volume ◽  
Optical Paths ◽  
Sensor Positions

Abstract. Pulse volume (PV) and its related measures, such as modified normalized pulse volume (mNPV), direct-current component (DC), and pulse rate (PR), derived from the finger-photoplethysmogram (FPPG), are useful psychophysiological measures. Although considerable uncertainties exist in finger-photoplethysmography, little is known about the extent of the adverse effects on the measures. In this study, we therefore examined the inter-method reliability of each index across sensor positions and light intensities, which are major disturbance factors of FPPG. From the tips of the index fingers of 12 participants in a resting state, three simultaneous FPPGs having overlapping optical paths were recorded, with their light intensity being changed in three steps. The analysis revealed that the minimum values of three coefficients of Cronbach’s α for ln PV, ln mNPV, ln DC, and PR across positions were .948, .850, .922, and 1.000, respectively, and that those across intensities were .774, .985, .485, and .998, respectively. These findings suggest that ln mNPV and PR can be used for psychophysiological studies irrespective of minor differences in sensor attachment positions and light source intensity, whereas and ln DC can also be used for such studies but under the condition of light intensity being fixed.

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