Influence of Applied Potential on the Characteristics of Photosensitive Non‐Self‐Maintained Region of a Low‐Frequency Electric Discharge

1955 ◽  
Vol 23 (7) ◽  
pp. 1373-1374 ◽  
Author(s):  
B. D. Khosla
1965 ◽  
Vol 43 (5) ◽  
pp. 910-920
Author(s):  
M. Venugopalan

The temperature dependence of the photosensitivity of an electric discharge with 50-cycle potentials in halogen-filled Siemens' tubes has been studied at constant gas pressure p as well as at constant mass conditions. The potential width of the photosensitive non-self-maintained region and the onset potentials of the self-maintained region of the discharge increased at constant p with the temperature T > 100 °C. In the self-maintained region of the discharge, irradiation by external light produced the familiar photoreduction of the discharge current i, viz. the negative Joshi effect, −Δi, which increased very little with T at constant p and applied potential V and reversed sign, depending on V, at 100–120 °C to the positive Joshi effect, +Δi, i.e., the photoincrease of i.Oscillographic studies of the current structure at [Formula: see text], the breakdown voltage in the dark, confirmed the co-occurrence of both +Δi and −Δi at T < 100 °C. They confirmed also that −Δi was absent at T > 100 °C. An integrating current detector which measured the resultant Δi showed that for a given p and T, +Δi increased with [Formula: see text] to a maximum; above Vm, +Δi decreased and reversed sign to −Δi as V was increased. At constant mass conditions, the Δi−V curve shifted towards the increasing potential axis by an increase in T. The potential at which +Δi was maximum and the potential at which the sign reversal of Δi occurred increased with T; the maximum magnitude of +Δi also increased with T > 100 °C.


Nature ◽  
1953 ◽  
Vol 171 (4360) ◽  
pp. 929-930 ◽  
Author(s):  
A. P. SAXENA ◽  
M. G. BHATAWDEKAR ◽  
N. A. RAMAIAH

Nature ◽  
1956 ◽  
Vol 178 (4541) ◽  
pp. 1073-1073
Author(s):  
D. P. JATAR ◽  
H. D. SHARMA

1983 ◽  
Vol 29 ◽  
Author(s):  
Richard A. Gottscho ◽  
Daniel L. Flamm ◽  
Randolph H. Burton ◽  
Vincent M. Donnelly

ABSTRACTWe describe the use of time-resolved laser-induced fluorescence (TRLIF) and plasma-induced emission (PIE) spectroscopy in studying the dynamics of ion transport, formation, and loss in low frequency RF plasmas, used in plasma etching and deposition. N2+ and Cl2+ ions formed in N2, Cl2, and N2/Cl2 discharges were monitored as a function of both position between the electrodes and magnitude of the applied rf potential. In the discharge center, TRLIF was used to measure ground state ionic lifetimes. In N2/Cl2 mixtures, N2+ was found to charge exchange rapidly with Cl2 and Cl to form Cl2+ and Cl+. In the electrode sheaths, the ion response to the applied potential was evident from periodic depletion of the ion concentration as a result of acceleration by the field. From the spatial variation in the ion concentration time dependence, we deduce that the sheaths expand and contract with the same period as the applied potential.


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