Characterization of the plasma in a radio-frequency magnetron sputtering system

A. Palmero; E. D. van Hattum; W. M. Arnoldbik; A. M. Vredenberg; F. H. P. M. Habraken

doi:10.1063/1.1728295

Characterization of the plasma in a radio-frequency magnetron sputtering system

Journal of Applied Physics ◽

10.1063/1.1728295 ◽

2004 ◽

Vol 95 (12) ◽

pp. 7611-7618 ◽

Cited By ~ 22

Author(s):

A. Palmero ◽

E. D. van Hattum ◽

W. M. Arnoldbik ◽

A. M. Vredenberg ◽

F. H. P. M. Habraken

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Sputtering System

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Characterization of Nb-doped MgZnO films grown by a radio-frequency magnetron sputtering system

2015 IEEE International Broadband and Photonics Conference (IBP) ◽

10.1109/ibp.2015.7230765 ◽

2015 ◽

Author(s):

Kuang-Po Hsueh ◽

Wen-Yen Lin ◽

Hsien-Chin Chiu ◽

Hsiang-Chun Wang ◽

Jinn-Kong Sheu ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Sputtering System

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Deposition and characterization of c-axis oriented aluminum nitride films by radio frequency magnetron sputtering without external substrate heating

Thin Solid Films ◽

10.1016/j.tsf.2011.02.074 ◽

2011 ◽

Vol 519 (18) ◽

pp. 5846-5853 ◽

Cited By ~ 31

Author(s):

Atul Vir Singh ◽

Sudhir Chandra ◽

G. Bose

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Substrate Heating

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Characterization of interface defects in BiFeO3 metal–oxide–semiconductor capacitors deposited by radio frequency magnetron sputtering

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-015-3174-1 ◽

2015 ◽

Vol 26 (8) ◽

pp. 5987-5993 ◽

Cited By ~ 7

Author(s):

Senol Kaya ◽

Ercan Yilmaz ◽

Aliekber Aktag ◽

Jan Seidel

Keyword(s):

Magnetron Sputtering ◽

Metal Oxide ◽

Radio Frequency ◽

Metal Oxide Semiconductor ◽

Radio Frequency Magnetron ◽

Oxide Semiconductor ◽

Radio Frequency Magnetron Sputtering ◽

Interface Defects

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Preparation and Characterization of 70TeO2-30WO3 Glass Thin Films by Radio-Frequency Magnetron Sputtering Method

Solid State Phenomena - Advances in Nanomaterials and Processing ◽

10.4028/3-908451-31-0.487 ◽

2007 ◽

pp. 487-490

Author(s):

Jin Hyeok Kim ◽

Ki Young Yoo ◽

Sang Hoon Shin ◽

Sun Hyun Youn ◽

Jong Ha Moon

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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Characterization of (Ba,Sr)TiO[sub 3] Thin Films on BaPbO[sub 3] Electrode Prepared by Radio Frequency Magnetron Sputtering

Journal of The Electrochemical Society ◽

10.1149/1.2120307 ◽

2005 ◽

Vol 152 (12) ◽

pp. F213 ◽

Cited By ~ 5

Author(s):

Chun-Sheng Liang ◽

Jenn-Ming Wu

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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Dielectric Properties and Leakage Current Characterization of the Ba(SnxTi1-x)O3Thin Films Prepared by Radio Frequency Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.7002 ◽

2006 ◽

Vol 45 (9A) ◽

pp. 7002-7008 ◽

Cited By ~ 3

Author(s):

Huey-Jiuan Lin ◽

Hong-Hsin Huang ◽

Chung-Yuan Chen ◽

Nan-Chung Wu ◽

Moo-Chin Wang

Keyword(s):

Dielectric Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Leakage Current ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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Characterization of (Pb1-xLax)TiO3 thin films grown by radio-frequency magnetron sputtering and their electrical properties

Integrated Ferroelectrics ◽

10.1080/10584589508012264 ◽

1995 ◽

Vol 10 (1-4) ◽

pp. 63-72 ◽

Cited By ~ 11

Author(s):

Su-Jin Chae ◽

Sang-Shik Park ◽

Soon-Gil Yoon ◽

Won-Jae Lee ◽

Ho-Gi Kim

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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Preparation and characterization of copper nitride films at various nitrogen contents by reactive radio-frequency magnetron sputtering

Materials Letters ◽

10.1016/j.matlet.2005.12.028 ◽

2006 ◽

Vol 60 (15) ◽

pp. 1809-1812 ◽

Cited By ~ 14

Author(s):

X.M. Yuan ◽

P.X. Yan ◽

J.Z. Liu

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Copper Nitride ◽

Nitrogen Contents

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Preparation and characterization of SrTiO3/BaTiO3 thin multilayer films deposited on Pt/Ti/SiO2/Si substrate by radio frequency magnetron sputtering

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2005.10.014 ◽

2005 ◽

Vol 351 (52-54) ◽

pp. 3809-3815 ◽

Cited By ~ 8

Author(s):

Hong-Hsin Huang ◽

Fu-Yuan Hsiao ◽

Nan-Chang Wu ◽

Moo-Chin Wang

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Multilayer Films ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Si Substrate

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Fabrication and characterization of superhard tungsten boride layers deposited by radio frequency magnetron sputtering

Ceramics International ◽

10.1016/j.ceramint.2016.04.166 ◽

2016 ◽

Vol 42 (10) ◽

pp. 12221-12230 ◽

Cited By ~ 26

Author(s):

Justyna Chrzanowska ◽

Łukasz Kurpaska ◽

Maciej Giżyński ◽

Jacek Hoffman ◽

Zygmunt Szymański ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Tungsten Boride ◽

Fabrication And Characterization

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