Sputtering of Metal Single Crystals by Ion Bombardment

1955 ◽  
Vol 26 (8) ◽  
pp. 1056-1057 ◽  
Author(s):  
Gottfried K. Wehner
1966 ◽  
Vol 44 (11) ◽  
pp. 2905-2914 ◽  
Author(s):  
J. L. Whitton ◽  
Hj. Matzke

The range and depth distributions of 40-keV xenon ions in single crystals of NaCl, KBr, MgO, SiO2 (α quartz), in sintered UO2 and in fused silica, have been measured by the sectioning techniques of vibratory polishing and chemical dissolution. Channeling is observed in the single crystals when the [Formula: see text] is oriented parallel to the incident beam of the ions. This effect is similar to that previously reported for some metal single crystals. High bombardment doses produce a factor of 2–5 decrease in penetration depth in MgO and SiO2, materials which are known to be damaged by ion bombardment. This decrease is smaller in materials that do not show gross ion bombardment damage, such as NaCl, KBr, and UO2. Thus, the study of ranges is shown to be another means of detecting gross radiation damage.


1951 ◽  
Vol 22 (3) ◽  
pp. 211-212 ◽  
Author(s):  
D. Lazarus ◽  
D. R. Chipman

Nature ◽  
1934 ◽  
Vol 133 (3372) ◽  
pp. 912-912 ◽  
Author(s):  
R. ROSCOE

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