scholarly journals Surface band bending in as-grown and plasma-treated n-type GaN films using surface potential electric force microscopy

2004 ◽  
Vol 84 (16) ◽  
pp. 3070-3072 ◽  
Author(s):  
Sang-Jun Cho ◽  
Seydi Doğan ◽  
Shahriar Sabuktagin ◽  
Michael A. Reshchikov ◽  
Daniel K. Johnstone ◽  
...  
2005 ◽  
Vol 892 ◽  
Author(s):  
Serguei Chevtchenko ◽  
M A Reshchikov ◽  
K Zhu ◽  
Y-T Moon ◽  
A A Baski ◽  
...  

AbstractThe influence of passivation with SiO2 and SiNx on optical properties and surface band bending in unintentionally doped GaN has been studied by steady-state photoluminescence (PL) and surface potential electric force microscopy (SP-EFM). For both types of passivation we observed a significant increase of PL intensity in air ambient at room temperature. The measured surface potential was the same for control and passivated samples within the experimental error. The value of the surface band-bending was determined as 1.0±0.2 eV in all cases. We suggest that the strong enhancement of PL is caused by reduction of contribution of the surface states to recombination of photogenerated carriers after passivation.


2006 ◽  
Vol 527-529 ◽  
pp. 1529-1532 ◽  
Author(s):  
S. Chevtchenko ◽  
Q. Fan ◽  
Cole W. Litton ◽  
A.A. Baski ◽  
Hadis Morkoç

It is generally accepted that the Schottky barrier height (SBH) is affected by the initial band bending at the bare nGaN surface as well as by an additional contribution following metal deposition. In this work the effect of processing used for device fabrication on the surface band bending of bare c-plane nGaN was studied by surface potential electric force microscopy (SP-EFM). An increase of the initial upward band bending from 1.0 ± 0.1eV for the as-grown GaN to 1.9 ± 0.1eV after RTA treatment in N2 ambient was observed. No significant dependence of band bending on N2 or Ar as ambient gas during the RTA treatment was observed. The increase of the initial upward band bending was also confirmed by photoluminescence (PL) measurements. We suggest that the RTA treatment causes a high density of surface states, possibly as a result of high temperature reaction of ambient gas and remnant contamination.


2001 ◽  
Vol 124 (2-3) ◽  
pp. 407-414 ◽  
Author(s):  
Joseph N. Barisci ◽  
Rita Stella ◽  
Geoffrey M. Spinks ◽  
Gordon G. Wallace

2016 ◽  
Vol 1 (1) ◽  
pp. 183 ◽  
Author(s):  
R. Vidyasagar ◽  
B. Camargo ◽  
E. Pelegova ◽  
K. Romanyuk ◽  
A.L. Kholkin

<p>In this work, we study surface potential of graphite deposited on SiO<sub>2</sub>/Si substrate using Kelvin Probe Force Microscopy (KPFM) and Electric Force Microscopy (EFM). The amplitude modulated KPFM (AM-KPFM) shows that the graphene layer work function is 4.69±0.02 eV, whereas frequency modulated KPFM (FM-KPFM) revealed 4.50±0.02 eV. The work function indifference of 0.19±0.02 eV was attributed to the superior resolution of FM-KPFM and higher detection sensitivity of AM-KPFM. Subsequent EFM mapping suggests that the phase monotonically increases with increasing applied <em>dc</em> bias voltage in the range from -5 V to 5 V. This phase shift is ascribed to the induced charge polarization at tip-graphene surface due to interatomic interactions induced by <em>dc</em> field effects.</p>


2021 ◽  
Vol 92 (2) ◽  
pp. 023703
Author(s):  
Khaled Kaja ◽  
Denis Mariolle ◽  
Nicolas Chevalier ◽  
Adnan Naja ◽  
Mustapha Jouiad

2010 ◽  
Vol 21 (22) ◽  
pp. 225702 ◽  
Author(s):  
Minhua Zhao ◽  
Xiaohong Gu ◽  
Sharon E Lowther ◽  
Cheol Park ◽  
Y C Jean ◽  
...  

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