Space charge lens for focusing negative ion beam: Theory and experiment

2004 ◽  
Vol 75 (5) ◽  
pp. 1774-1776 ◽  
Author(s):  
I. A. Soloshenko ◽  
V. P. Goretsky ◽  
V. N. Gorshkov ◽  
A. M. Zavalov
Keyword(s):  
Space Charge ◽  
Ion Beam ◽  
Beam Theory ◽  
Negative Ion ◽  
Theory And Experiment

Simulation of space charge compensation in a multibeamlet negative ion beam

2016 ◽  
Vol 87 (2) ◽  
pp. 02B917 ◽  
Author(s):  
E. Sartori ◽  
T. J. Maceina ◽  
P. Veltri ◽  
M. Cavenago ◽  
G. Serianni
Keyword(s):  
Space Charge ◽  
Ion Beam ◽  
Charge Compensation ◽  
Negative Ion

Process of compensation of the space charge of a negative ion beam in a gas

2007 ◽  
Vol 33 (12) ◽  
pp. 1032-1037 ◽  
Author(s):  
V. N. Gorshkov ◽  
A. M. Zavalov ◽  
I. A. Soloshenko
Keyword(s):  
Space Charge ◽  
Ion Beam ◽  
Negative Ion

Aberration of a negative ion beam caused by space charge effect

2010 ◽  
Vol 81 (2) ◽  
pp. 02A724 ◽  
Author(s):  
K. Miyamoto ◽  
S. Wada ◽  
A. Hatayama
Keyword(s):  
Space Charge ◽  
Ion Beam ◽  
Space Charge Effect ◽  
Negative Ion ◽  
Charge Effect

Space-charge lens for focusing negative ion beam

2002 ◽  
Vol 73 (3) ◽  
pp. 1161-1164 ◽  
Author(s):  
V. P. Goretsky ◽  
I. A. Soloshenko ◽  
A. I. Shchedrin
Keyword(s):  
Space Charge ◽  
Ion Beam ◽  
Negative Ion

Space-charge lens for focusing a negative-ion beam

2003 ◽  
Vol 29 (6) ◽  
pp. 480-484
Author(s):  
A. M. Zavalov ◽  
V. N. Gorshkov ◽  
V. P. Goretskii ◽  
I. A. Soloshenko
Keyword(s):  
Space Charge ◽  
Ion Beam ◽  
Negative Ion

scholarly journals A Study on the negative ion beam production in the ININ sputtering ion source

2019 ◽  
Vol 65 (3) ◽  
pp. 278
Author(s):  
C. A. Valerio Lizarraga ◽  
C. Duarte-Galvan ◽  
I. Leon-Monzon ◽  
P. Villaseñor ◽  
And J. Aspiazu
Keyword(s):  
Space Charge ◽  
Particle Tracking ◽  
Linear Accelerator ◽  
Ion Beam ◽  
Negative Ions ◽  
Ion Source ◽  
Beam Dynamics ◽  
Negative Ion ◽  
Beam Generation ◽  
Beam Production

To improve the beam brightness produced by a Source of Negative Ions by Cesium Sputtering we studied the beam generation in the 12~MeV Vandergraff linear accelerator at Instituto Nacional de Investigaciones Nucleares. Results of 3D particle tracking simulations of the ion source and beamline have been compared with measurements, with better agreement than traditional codes that only take into account the negative beam, and they determine a suppression in the Cs$^{+}$ production due to space charge, which in turn explains the intensity limits for negative beam production in both ionizers, and the best way to overpass them. Also, the beam dynamics variation due to the erosion of the target inside the cathode has been determined, helping to prevent beam losses and enhance the beam brightness.

scholarly journals Negative ion beam space charge compensation by residual gas

2015 ◽  
Vol 18 (8) ◽  
Author(s):  
Cristhian A. Valerio-Lizarraga ◽  
Ildefonso Leon-Monzon ◽  
Richard Scrivens
Keyword(s):  
Space Charge ◽  
Ion Beam ◽  
Charge Compensation ◽  
Negative Ion ◽  
Residual Gas

Characteristics of extracted ion beam from a cesium-free negative ion source using sheet plasma

2020 ◽  
Vol 91 (11) ◽  
pp. 113302
Author(s):  
H. Kaminaga ◽  
T. Takimoto ◽  
A. Tonegawa ◽  
K. N. Sato
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Negative Ion ◽  
Sheet Plasma

scholarly journals Negative ion beam acceleration and transport in the high voltage injector prototype

2021 ◽  
Author(s):  
O. Sotnikov ◽  
A. Sanin ◽  
Yu. Belchenko ◽  
A. A. Ivanov ◽  
G. Abdrashitov ◽  
...  
Keyword(s):  
High Voltage ◽  
Ion Beam ◽  
Negative Ion

Carbon Nitride Film Formation by Low Energy Positive and Negative Ion Beam Deposition

1996 ◽  
Vol 438 ◽  
Author(s):  
N. Tsubouchi ◽  
Y. Horino ◽  
B. Enders ◽  
A. Chayahara ◽  
A. Kinomura ◽  
...  
Keyword(s):  
Carbon Nitride ◽  
Rutherford Backscattering Spectrometry ◽  
Ion Beam ◽  
High Vacuum ◽  
Negative Ions ◽  
Low Energy ◽  
Ultra High Vacuum ◽  
Negative Ion ◽  
Nitride Film ◽  
Ion Energy

AbstractUsing a newly developed ion beam apparatus, PANDA (Positive And Negative ions Deposition Apparatus), carbon nitride films were prepared by simultaneous deposition of mass-analyzed low energy positive and negative ions such as C2-, N+, under ultra high vacuum conditions, in the order of 10−6 Pa on silicon wafer. The ion energy was varied from 50 to 400 eV. The film properties as a function of their beam energy were evaluated by Rutherford Backscattering Spectrometry (RBS), Fourier Transform Infrared spectroscopy (FTIR) and Raman scattering. From the results, it is suggested that the C-N triple bond contents in films depends on nitrogen ion energy.

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