A Low‐Current Low‐Energy‐Spread Duoplasmatron Ion Source

1971 ◽  
Vol 42 (3) ◽  
pp. 354-355 ◽  
Author(s):  
M. Steinberg ◽  
B. Yap ◽  
H. H. Fleischmann
Keyword(s):  
Ion Source ◽  
Low Energy ◽  
Energy Spread

High Intensity, Low Energy Spread Ion Source for Chemical Accelerators

1969 ◽  
Vol 40 (1) ◽  
pp. 102-105 ◽  
Author(s):  
Michael Menzinger ◽  
Lars Wåhlin
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Low Energy ◽  
Energy Spread

Resolution improvement of ion projector with a low energy spread multicusp ion source

1999 ◽  
Vol 46 (1-4) ◽  
pp. 477-480 ◽  
Author(s):  
W.H. Bruenger ◽  
M. Torkler ◽  
K.N. Leung ◽  
Y. Lee ◽  
M.D. Williams ◽  
...  
Keyword(s):  
Ion Source ◽  
Low Energy ◽  
Energy Spread ◽  
Multicusp Ion Source ◽  
Resolution Improvement

New Ion Source for High Precision FIB Nanomachining and Circuit Edit

2014 ◽  
Author(s):  
Adam V. Steele ◽  
Brenton Knuffman ◽  
Jabez J. McClelland
Keyword(s):  
Low Temperature ◽  
Failure Analysis ◽  
High Precision ◽  
Spot Size ◽  
Ion Source ◽  
Low Energy ◽  
Energy Spread ◽  
Site Specific ◽  
High Brightness ◽  
Source Characteristics

Abstract We present a review of the Low Temperature Ion Source (LoTIS): its aims, design, performance data collected to date, and focused spot size projections when integrated with a FIB. LoTIS provides a Cs+ beam that has been measured to have high brightness (> 107Am-2sr-1eV-1), and low-energy spread (< 0.5 eV). These source characteristics enable a prediction of subnm focused spot sizes. A FIB with the capabilities enabled by LoTIS would be well-suited to addressing FIB failure analysis tasks such as nanomachining, circuit edit, and site-specific SIMS.

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