CHEMICAL EFFECTS ON THE KLL AUGER ELECTRON SPECTRUM FROM SURFACE CARBON

1970 ◽  
Vol 16 (4) ◽  
pp. 172-173 ◽  
Author(s):  
T. W. Haas ◽  
J. T. Grant
Keyword(s):  
Electron Spectrum ◽  
Auger Electron ◽  
Surface Carbon ◽  
Auger Electron Spectrum ◽  
Chemical Effects

Experimental auger electron spectrum of ammonia

1977 ◽  
Vol 46 (1) ◽  
pp. 146-150 ◽  
Author(s):  
J.M. White ◽  
R.R. Rye ◽  
J.E. Houston
Keyword(s):  
Electron Spectrum ◽  
Auger Electron ◽  
Auger Electron Spectrum

scholarly journals The KLM + KLN Auger electron spectrum of rubidium in different matrices

2017 ◽  
Vol 50 (15) ◽  
pp. 155001 ◽  
Author(s):  
A Kh Inoyatov ◽  
A Kovalík ◽  
L L Perevoshchikov ◽  
D V Filosofov ◽  
D Vénos ◽  
...  
Keyword(s):  
Electron Spectrum ◽  
Auger Electron ◽  
Auger Electron Spectrum

A detailed experimental investigation of the KMM+KMN+KNN Auger electron spectrum of 111Cd from the EC-decay of 111In

2006 ◽  
Vol 151 (3) ◽  
pp. 193-198 ◽  
Author(s):  
A. Inoyatov ◽  
A.V. Lubashevsky ◽  
A. Kovalík ◽  
E.A. Yakushev ◽  
D.V. Filosofov ◽  
...  
Keyword(s):  
Experimental Investigation ◽  
Electron Spectrum ◽  
Auger Electron ◽  
Auger Electron Spectrum

High resolution auger electron spectrum of MgO(100)

1972 ◽  
Vol 33 (1) ◽  
pp. 213-218 ◽  
Author(s):  
P.J. Bassett ◽  
T.E. Gallon ◽  
M. Prutton ◽  
J.A.D. Matthew
Keyword(s):  
High Resolution ◽  
Electron Spectrum ◽  
Auger Electron ◽  
Auger Electron Spectrum

UHV-Investigation on MOCVD-grown InP(100) Surfaces

1999 ◽  
Vol 570 ◽  
Author(s):  
S. Visbeck ◽  
T. Hannappel ◽  
P. Vogt ◽  
J. Mahrt ◽  
M. Zorn ◽  
...  
Keyword(s):  
Partial Pressure ◽  
Surface Structure ◽  
Electron Spectrum ◽  
Auger Electron ◽  
Critical Case ◽  
Ex Situ ◽  
Bulk Properties ◽  
Auger Electron Spectrum ◽  
Reflectance Anisotropy ◽  
Mocvd Reactor

ABSTRACTEpitaxial InP(100)-films were prepared with TBP (tertiarybutylphosphine) and TMIn (trimethylindium) as precursors in a commercial MOCVD reactor. During growth, the V-III-ratio and TBP partial pressure were varied between 50 and 1 and possible changes of the surface structure monitored with the corresponding RAS (reflectance anisotropy spectroscopy) signal based on a correlation established with corresponding LEED measurements. Bulk properties of these films were investigated ex-situ with photoluminescence at 2 K, showing no noticeable difference between the samples. The MOCVD apparatus was modified to facilitate transfer of the sample from the MOCVD environment to UIHV in less than 20 seconds (to the 10−9 mbar range). After transfer, the same RA spectrum was recovered also in the critical case of the P-rich, as-grown surface. A corresponding Auger electron spectrum (AES) did not show any trace of contamination. Furthermore, the surface structure was investigated with LEED and STM. The LEED picture shows a clear (2×l)-pattern with a weak twofold symmetry along the [011] direction, STM pictures revealed a disordered surface terminated by P-dimers

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