In-line, Non-destructive Electrical Metrology of Nitrided Silicon Dioxide and High-k Gate Dielectric Layers

2003 ◽  
Author(s):  
Robert J. Hillard
Keyword(s):  
Silicon Dioxide ◽  
Gate Dielectric ◽  
Dielectric Layers ◽  
High K ◽  
Non Destructive ◽  
High K Gate Dielectric

Effective electrical passivation of Ge(100) for high-k gate dielectric layers using germanium oxide

2007 ◽  
Vol 91 (8) ◽  
pp. 082904 ◽  
Author(s):  
Annelies Delabie ◽  
Florence Bellenger ◽  
Michel Houssa ◽  
Thierry Conard ◽  
Sven Van Elshocht ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Germanium Oxide ◽  
Dielectric Layers ◽  
High K ◽  
High K Gate Dielectric

Observation and characterization of defects in HfO2 high-K gate dielectric layers

2005 ◽  
Vol 45 (5-6) ◽  
pp. 798-801 ◽  
Author(s):  
Vidya Kaushik ◽  
Martine Claes ◽  
Annelies Delabie ◽  
Sven Van Elshocht ◽  
Olivier Richard ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Dielectric Layers ◽  
High K ◽  
High K Gate Dielectric

Experimental observations of the thermal stability of high-k gate dielectric materials on silicon

2002 ◽  
Vol 303 (1) ◽  
pp. 54-63 ◽  
Author(s):  
P.S. Lysaght ◽  
P.J. Chen ◽  
R. Bergmann ◽  
T. Messina ◽  
R.W. Murto ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Gate Dielectric ◽  
Dielectric Materials ◽  
High K ◽  
Thermal Stability Of ◽  
High K Gate Dielectric
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