scholarly journals Ordered structure and twin boundary of triblock copolymer/silica mesophase thin films

2003 ◽  
Vol 83 (17) ◽  
pp. 3492-3494 ◽  
Author(s):  
Chi Won Ahn ◽  
Theo Rasing ◽  
Mahn Won Kim
Keyword(s):  
Thin Films ◽  
Twin Boundary ◽  
Triblock Copolymer ◽  
Ordered Structure

Morphological transformations in solution-cast Styrene-Butadiene-Styrene (SBS) triblock copolymer thin films

1995 ◽  
Vol 53 ◽  
pp. 184-185
Author(s):  
Ginam Kim ◽  
W. Marsillo ◽  
M. Libera
Keyword(s):  
Thin Films ◽  
Triblock Copolymer ◽  
Annealing Treatment ◽  
Minor Component ◽  
Solvent Evaporation ◽  
Single Crystal Substrate ◽  
Transparent Films ◽  
Crystal Substrate ◽  
Solution Cast ◽  
Morphological Transformations

The fact that block copolymers can assume a range of morphologies depending upon such variables as relative block length and molecular weight is now well known. In the case of poly(styrene)[PS]-poly(butadiene)[PB]-poly(styrene) (SBS) triblock copolymer, the morphologies range from spheres (roughly ~20% minor component), to cylinders (roughly 20%~35% minor component), to lamellae (roughly equal component fractions) Most recently, there has been increasing interest in transformations between morphologies by thermal annealing. This paper describes initial results studying the effect of solvent evaporation rate and post-casting annealing treatment on the morphology of SBS thin films.TEM specimens were prepared by solution casting electron transparent films. 50 μl of 0.1 wt% SBS (30% styrene, Mw=14,000, Scientific Polymer Products, Inc.) dissolved in toluene was deposited on a polished NaCl single crystal substrate placed in a small dish. After solvent evaporation the film was cut into small squares, floated from the salt in water, and each square was collected on a Cu grid.

scholarly journals Triblock copolymer micelles as templates for preparation of mesoporous niobia thin films

2018 ◽  
Vol 992 ◽  
pp. 012037 ◽  
Author(s):  
R Georgiev ◽  
D Christova ◽  
L Todorova ◽  
B Georgieva ◽  
M Vasileva ◽  
...  
Keyword(s):  
Thin Films ◽  
Triblock Copolymer ◽  
Copolymer Micelles

Synthesis and electrochemical properties of mesostructured 12-phosphotungstic acid thin films with hierarchical structures by triblock copolymer templating

2003 ◽  
Vol 788 ◽  
Author(s):  
Hui-suk Yun ◽  
Makoto Kuwabara ◽  
Haoshen Zhou ◽  
Itaru Honma
Keyword(s):  
Thin Films ◽  
Block Copolymers ◽  
Electrochemical Properties ◽  
Triblock Copolymer ◽  
Phosphotungstic Acid ◽  
Specific Capacity ◽  
Hierarchical Structures ◽  
Keggin Anion ◽  
Monoclinic Crystal ◽  
Organic Part

ABSTRACTHexagonally mesostructured 12-phosphotungstic acid (PWA) thin films with both large pore size and hierarchical structures have been successfully prepared by using triblock copolymer templates for the first time. The films is composed by three kind of structures; PWA Keggin anion, monoclinic crystal structure consisting of PWA Keggin anion and organic part (hydrophilic component) of block copolymers, and the hexagonal mesostructure of self-arrayed PWA and block copolymers. The calcined PWA films show better electrochemical properties such as a faster faradic processes and larger specific capacity than normal P WA clusters.

Square Packing and Structural Arrangement of ABC Triblock Copolymer Spheres in Thin Films

2008 ◽  
Vol 41 (12) ◽  
pp. 4328-4339 ◽  
Author(s):  
Chuanbing Tang ◽  
Joona Bang ◽  
Gila E. Stein ◽  
Glenn H. Fredrickson ◽  
Craig J. Hawker ◽  
...  
Keyword(s):  
Thin Films ◽  
Triblock Copolymer ◽  
Structural Arrangement ◽  
Abc Triblock Copolymer ◽  
Square Packing

Study Morphology Transitions in Self-Assembled Triblock Copolymer Thin Films with Nanostructures by AFM

2006 ◽  
Vol 532-533 ◽  
pp. 165-168
Author(s):  
Yong Zhi Cao ◽  
Shen Dong ◽  
Ying Chun Liang ◽  
Tao Sun
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Triblock Copolymer ◽  
Low Cost ◽  
Orientational Order ◽  
Solvent Annealing ◽  
Force Microscopy ◽  
Atomic Force ◽  
Ordered Nanostructures ◽  
Self Assembled

As a “bottom-up” approach to nanostructures for nanofabrication, self-assembled block copolymer thin films have received much attention not only thanks to the scale of the microdomains but also due to the convenient shape tunability. In order to realize applications of self-assembled block copolymer thin films in nanotechnologies, control over microdomain spatial and orientational order is paramount. In this paper, using atomic force microscopy (AFM), we studied systemically nanostructure transitions induced by post-solvent annealing in self-assembled block copolymer thin films. Furthermore, a variety of thin films with well-ordered nanostructures, which can be employed as templates for nanotechnologies, have been realized simply and at low cost.

Systematic Study on the Effect of Solvent Removal Rate on the Morphology of Solvent Vapor Annealed ABA Triblock Copolymer Thin Films

ACS Nano ◽  
2011 ◽  
Vol 6 (1) ◽  
pp. 459-466 ◽  
Author(s):  
Julie N. L. Albert ◽  
Wen-Shiue Young ◽  
Ronald L. Lewis ◽  
Timothy D. Bogart ◽  
Jasmine R. Smith ◽  
...  
Keyword(s):  
Thin Films ◽  
Systematic Study ◽  
Triblock Copolymer ◽  
Removal Rate ◽  
Solvent Vapor ◽  
Solvent Removal ◽  
Effect Of Solvent ◽  
Aba Triblock Copolymer

Strain-effect for controlled growth mode and well-ordered structure of quaterrylene thin films

2010 ◽  
Vol 133 (3) ◽  
pp. 034706 ◽  
Author(s):  
Ryoma Hayakawa ◽  
Ayse Turak ◽  
XueNa Zhang ◽  
Nobuya Hiroshiba ◽  
Helmut Dosch ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Mode ◽  
Strain Effect ◽  
Controlled Growth ◽  
Ordered Structure
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