Strong photoluminescence and cathodoluminescence due to f–f transitions in Eu3+ doped Al2O3 powders prepared by direct combustion synthesis and thin films deposited by laser ablation

2003 ◽  
Vol 83 (2) ◽  
pp. 272-274 ◽  
Author(s):  
Nikifor Rakov ◽  
Francisco E. Ramos ◽  
Gustavo Hirata ◽  
Mufei Xiao
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Combustion Synthesis ◽  
Direct Combustion

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

Laser ablation of YBCO targets and optical-breakdown-assisted PLD for high T c superconducting thin films deposition

1998 ◽  
Author(s):  
Ileana Apostol ◽  
Razvan Stoian ◽  
C. Luculescu ◽  
Razvan V. Dabu ◽  
Aurel Stratan ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Optical Breakdown ◽  
Superconducting Thin Films

scholarly journals Organic thin films formation by laser ablation.

1993 ◽  
Vol 6 (3) ◽  
pp. 429-432 ◽  
Author(s):  
KENJIN HIGAKI ◽  
CHIAKI NAGAI ◽  
OSAMU MURATA ◽  
HAYAMI ITOH
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Organic Thin Films

Synthesis of Nd-doped Si thin films by laser ablation

2010 ◽  
pp. NA-NA
Author(s):  
Shinji Kawai ◽  
Shuji Komuro ◽  
Toru Katsumata
Keyword(s):  
Thin Films ◽  
Laser Ablation

scholarly journals Preparation and Properties of Superconducting thin Films by Excimer Laser Ablation

1990 ◽  
Vol 191 ◽  
Author(s):  
Michael E. Geusic ◽  
Alan F. Stewart ◽  
Larry R. Pederson ◽  
William J. Weber ◽  
Kenneth R. Marken ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Excimer Laser ◽  
Laser Energy ◽  
Substrate Surface ◽  
Xrd Analysis ◽  
Zero Field ◽  
Superconducting Transition ◽  
X Ray Diffraction ◽  
Excimer Laser Ablation

ABSTRACTExcimer laser ablation with an in situ heat treatment was used to prepare high quality superconducting YBa2Cu3O7−x thin films on (100)-SrTiO3 and (100)-LaAlO3 substrates. A pulsed excimer laser (XeCl; 308 nm) was used to ablate a rotating, bulk YBa2Cu3O7−x target at a laser energy density of 2–3 J/cm2. Based on four-probe dc resistance measurements, the films exhibited superconducting transition temperatures (Tc, midpoint) of 88 and 87K with 2K (90–10%) transition widths for SrTiO3 and LaAlO3, respectively. Transport critical current densities (Jc) measured at 77K were 2 × 106 and 1 × 106 A/cm2 in zero field for SrTiO3 and LaAlO3, respectively. X-ray diffraction (XRD) analysis showed the films to be highly oriented, with the c-axis perpendicular to the substrate surface.

ZnS thin films grown on Si(100) by XeCl pulsed laser ablation

2001 ◽  
Vol 177 (1-2) ◽  
pp. 73-77 ◽  
Author(s):  
K.T Hillie ◽  
C Curren ◽  
H.C Swart
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation

Fabrication of particle-free thin films by laser ablation combined with an electron beam

2006 ◽  
Vol 500 (1-2) ◽  
pp. 101-104 ◽  
Author(s):  
Tadashi Kitahara ◽  
Yoshiro Nomoto ◽  
Norio Ichikawa
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Laser Ablation
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