Polarized total-reflection x-ray absorption fine structure for self-assembled monolayer of zinc porphyrin at air–water interface

2003 ◽  
Vol 118 (23) ◽  
pp. 10369-10371 ◽  
Author(s):  
Hajime Tanida ◽  
Hirohisa Nagatani ◽  
Iwao Watanabe
Keyword(s):  
Fine Structure ◽  
Total Reflection ◽  
Water Interface ◽  
Self Assembled Monolayer ◽  
Zinc Porphyrin ◽  
X Ray ◽  
Absorption Fine ◽  
Air Water Interface ◽  
Self Assembled ◽  
X Ray Absorption

Zinc(II) Porphyrins at the Air−Water Interface As Studied by Polarized Total-Reflection X-ray Absorption Fine Structure

Langmuir ◽  
2006 ◽  
Vol 22 (1) ◽  
pp. 209-212 ◽  
Author(s):  
Hirohisa Nagatani ◽  
Hajime Tanida ◽  
Toru Ozeki ◽  
Iwao Watanabe
Keyword(s):  
Fine Structure ◽  
Total Reflection ◽  
Water Interface ◽  
X Ray ◽  
Absorption Fine ◽  
Air Water Interface ◽  
X Ray Absorption

Evaluation of Fluorinated Self-Assembled Monolayer by Photoelectron and Near Edge X-Ray Absorption Fine Structure Spectroscopy

2015 ◽  
Vol 98 (11) ◽  
pp. 35-40
Author(s):  
YUICHI HARUYAMA ◽  
MAKOTO OKADA ◽  
YASUKI NAKAI ◽  
TAKAO ISHIDA ◽  
SHINJI MATSUI
Keyword(s):  
Fine Structure ◽  
Self Assembled Monolayer ◽  
X Ray ◽  
Absorption Fine ◽  
Self Assembled ◽  
X Ray Absorption

Polarized Total-Reflection X-ray Absorption Fine Structure of Zinc(II) Porphyrin at the Heptane−Water Interface

2010 ◽  
Vol 114 (43) ◽  
pp. 18583-18587 ◽  
Author(s):  
Hirohisa Nagatani ◽  
Hajime Tanida ◽  
Makoto Harada ◽  
Maki Asada ◽  
Takamasa Sagara
Keyword(s):  
Fine Structure ◽  
Total Reflection ◽  
Water Interface ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption

A Near Edge X-ray Absorption Fine Structure Spectroscopy Investigation of the Structure of Self-Assembled Films of Octadecyltrichlorosilane

Langmuir ◽  
2002 ◽  
Vol 18 (4) ◽  
pp. 1250-1256 ◽  
Author(s):  
Richard D. Peters ◽  
Paul F. Nealey ◽  
Jason N. Crain ◽  
Franz J. Himpsel
Keyword(s):  
Fine Structure ◽  
X Ray ◽  
Absorption Fine ◽  
Self Assembled ◽  
X Ray Absorption

X–ray absorption fine structure (XAFS) of Si wafer measured using total reflection X–rays

1999 ◽  
Vol 54 (1) ◽  
pp. 215-222 ◽  
Author(s):  
Jun Kawai ◽  
Shinjiro Hayakawa ◽  
Yoshinori Kitajima ◽  
Yohichi Gohshi
Keyword(s):  
Fine Structure ◽  
Total Reflection ◽  
X Rays ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption ◽  
Si Wafer
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