Electron beam generation in a diode with a gaseous plasma electron source II: Plasma source based on a hollow anode ignited by a hollow-cathode source

2003 ◽  
Vol 94 (1) ◽  
pp. 55-61 ◽  
Author(s):  
A. Krokhmal ◽  
J. Z. Gleizer ◽  
Ya. E. Krasik ◽  
J. Felsteiner ◽  
V. I. Gushenets
Keyword(s):  
Electron Beam ◽  
Hollow Cathode ◽  
Plasma Source ◽  
Plasma Electron ◽  
Electron Source ◽  
Electron Beam Generation ◽  
Beam Generation ◽  
Hollow Anode ◽  
Plasma Electron Source ◽  
Gaseous Plasma

Hollow cathode vacuum arc plasma electron source for the generation of a high-current DC electron beam

Vacuum ◽  
2016 ◽  
Vol 134 ◽  
pp. 83-87 ◽  
Author(s):  
Jianping Xu ◽  
Xiubo Tian ◽  
Chunzhi Gong ◽  
Chunwei Li ◽  
Chuang Yang
Keyword(s):  
Electron Beam ◽  
Hollow Cathode ◽  
Plasma Electron ◽  
Electron Source ◽  
Vacuum Arc ◽  
Arc Plasma ◽  
High Current ◽  
Plasma Electron Source

Ribbon electron beam formation by a forevacuum plasma electron source

2016 ◽  
Vol 42 (1) ◽  
pp. 96-99 ◽  
Author(s):  
A. S. Klimov ◽  
V. A. Burdovitsin ◽  
A. A. Grishkov ◽  
E. M. Oks ◽  
A. A. Zenin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Plasma Electron ◽  
Electron Source ◽  
Plasma Electron Source ◽  
Beam Formation

scholarly journals Forevacuum plasma source of continuous electron beam

2019 ◽  
Vol 37 (2) ◽  
pp. 203-208 ◽  
Author(s):  
Aleksandr Klimov ◽  
Ilya Bakeev ◽  
Efim Oks ◽  
Aleksey Zenin
Keyword(s):  
Electron Beam ◽  
Power Density ◽  
Hollow Cathode ◽  
Plasma Source ◽  
Electron Source ◽  
Hollow Cathode Discharge ◽  
Maximum Power ◽  
Maximum Power Density ◽  
Plasma Cathode ◽  
Pressure Plasma

AbstractWe describe here the design, main parameters, and characteristics of a forevacuum-pressure plasma-cathode electron source based on a hollow-cathode discharge. The source generates a continuous focused electron beam with energy up to 30 keV and current up to 300 mA at a pressure of 10–50 Pa. The focused electron beam reaches a maximum power density of 106 W/cm2. The source utility has been demonstrated by its application for processing and cutting of ceramic.

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