Optical properties of TiO2 thin films estimated by photothermal deflection spectroscopy

2003 ◽  
Vol 74 (1) ◽  
pp. 863-865 ◽  
Author(s):  
S. Ogawa ◽  
K. Mori ◽  
H. Natsuhara ◽  
T. Ohashi ◽  
R. Sakakiyama ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Tio2 Thin Films ◽  
Photothermal Deflection Spectroscopy ◽  
Photothermal Deflection

Optical properties of CdTe thin films studied by photothermal deflection spectroscopy

1983 ◽  
Vol 102 (3) ◽  
pp. 259-263 ◽  
Author(s):  
J.G. Mendoza-Alvarez ◽  
B.S.H. Royce ◽  
F. Sánchez-Sinencio ◽  
O. Zelaya-Angel ◽  
C. Menezes ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Photothermal Deflection Spectroscopy ◽  
Cdte Thin Films ◽  
Photothermal Deflection

STRUCTURAL, OPTICAL PROPERTIES AND PHOTOCATALYTIC ACTIVITY OF NANOCRYSTALLINE TiO2 THIN FILMS DEPOSITED BY SOL-GEL SPIN COATING

2019 ◽  
Vol 7 (1) ◽  
pp. 28
Author(s):  
KOMARAIAH DURGAM ◽  
RADHA EPPA ◽  
REDDY M. V. RAMANA ◽  
KUMAR J. SIVA ◽  
R. SAYANNA ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Photocatalytic Activity ◽  
Spin Coating ◽  
Sol Gel ◽  
Tio2 Thin Films ◽  
Nanocrystalline Tio2

Structural, electrical and optical properties of In doped brookite TiO2 thin films deposited on YSZ (110) substrates by MOCVD

2017 ◽  
Vol 708 ◽  
pp. 1195-1200 ◽  
Author(s):  
Weiguang Wang ◽  
Wei Zhao ◽  
Xianjin Feng ◽  
Linan He ◽  
Qiong Cao ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Tio2 Thin Films ◽  
Electrical And Optical Properties

scholarly journals Photothermal Deflection Spectroscopy Study of Nanocrystalline Si (nc-Si) Thin Films Deposited on Porous Aluminum with PECVD

2012 ◽  
Vol 2012 ◽  
pp. 1-5 ◽  
Author(s):  
S. Ktifa ◽  
M. Ghrib ◽  
F. Saadallah ◽  
H. Ezzaouia ◽  
N. Yacoubi
Keyword(s):  
Optical Properties ◽  
Energy Gap ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Porous Aluminum ◽  
Force Microscopy ◽  
Photothermal Deflection Spectroscopy ◽  
Atomic Force ◽  
Photothermal Deflection ◽  
Morphology Characterization

We have studied the optical properties of nanocrystalline silicon (nc-Si) film deposited by plasma enhancement chemical vapor deposition (PECVD) on porous aluminum structure using, respectively, the Photothermal Deflection Spectroscopy (PDS) and Photoluminescence (PL). The aim of this work is to investigate the influence of anodisation current on the optical properties of the porous aluminum silicon layers (PASL). The morphology characterization studied by atomic force microscopy (AFM) technique has shown that the grain size of (nc-Si) increases with the anodisation current. However, a band gap shift of the energy gap was observed.

Effect of Annealing on Structural and Optical Properties of Pulsed Laser Deposited Titanium Dioxide Thin Films

2009 ◽  
Vol 67 ◽  
pp. 65-70 ◽  
Author(s):  
Gaurav Shukla ◽  
Alika K. Khare
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Annealing Temperature ◽  
Ambient Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Tio2 Thin Films ◽  
Post Annealing ◽  
Post Annealing Temperature

TiO2 is a widely studied material for many important applications in areas such as environmental purification, photocatalyst, gas sensors, cancer therapy and high effect solar cell. However, investigations demonstrated that the properties and applications of titanium oxide films depend upon the nature of the crystalline phases present in the films, i.e. anatase and rutile phases. We report on the pulsed laser deposition of high quality TiO2 thin films. Pulsed Laser deposition of TiO2 thin films were performed in different ambient viz. oxygen, argon and vacuum, using a second harmonic of Nd:YAG laser of 6 ns pulse width. These deposited films of TiO2 were further annealed for 5hrs in air at different temperatures. TiO2 thin films were characterized using x-ray diffraction, SEM, photoluminescence, transmittance and reflectance. We observed effect of annealing over structural, morphological and optical properties of TiO2 thin films. The anatase phase of as-deposited TiO2 thin films is found to change into rutile phase with increased annealing temperature. Increase in crystalline behaviour of thin films with post-annealing temperature is also observed. Surface morphology of TiO2 thin films is dependent upon ambient pressure and post- annealing temperature. TiO2 thin films are found to be optically transparent with very low reflectivity hence will be suitable for antireflection coating applications.

Effects of Co doping on the phase transformation and optical properties of TiO2 thin films by sol–gel method

2011 ◽  
Vol 44 (3) ◽  
pp. 550-554 ◽  
Author(s):  
Jianjun Tian ◽  
Hongmei Deng ◽  
Lin Sun ◽  
Hui Kong ◽  
Pingxiong Yang ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Transformation ◽  
Optical Properties ◽  
Sol Gel ◽  
Tio2 Thin Films ◽  
Gel Method ◽  
Sol Gel Method ◽  
Co Doping

Photoelectrochemical and optical properties of N-doped TiO2 thin films prepared by oxidation of sputtered TiNx films

Vacuum ◽  
2010 ◽  
Vol 84 (6) ◽  
pp. 797-802 ◽  
Author(s):  
Lei Zhu ◽  
Jianshe Xie ◽  
Xiaoli Cui ◽  
Jie Shen ◽  
Xiliang Yang ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Tio2 Thin Films ◽  
Doped Tio2
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