Structural and dielectric characterization of the (Ba1−xSrx)(Ti0.9Sn0.1)O3 thin films deposited on Pt/Ti/SiO2/Si substrate by radio frequency magnetron sputtering
2007 ◽
pp. 487-490
2005 ◽
Vol 152
(12)
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pp. F213
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1995 ◽
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pp. 63-72
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2005 ◽
Vol 351
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pp. 3809-3815
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1997 ◽
Vol 144
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pp. 2855-2858
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2000 ◽
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1988 ◽
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pp. 235-242
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