Evolution of Stress Relaxation Structures for Several Polymers Subjected to Plane Shock Compression around 0.5 GPa Shock Stress Measured by PVDF Gauge

2002 ◽  
Author(s):  
Yasuhito Mori
1967 ◽  
Author(s):  
Gordon D. Anderson ◽  
William J. Murri ◽  
Roy C. Alverson ◽  
Sathyanarayana V. Hanagud

2020 ◽  
Vol 90 (6) ◽  
pp. 961
Author(s):  
И.А. Черепанов ◽  
А.С. Савиных ◽  
С.В. Разоренов

Shock wave profiles of sapphire with eight crystallographic orientations с m, a, s, r, g, n and d -cut were measured at shock stresses in the range 15–20 GPa. Measured values of spall strength depend on direction of shock compression and peak shock stress. The largest spall strength values ~12–13 GPa were recorded for peak shock stress 16 GPa along the a-axis and the m-direction.


2014 ◽  
Vol 500 (14) ◽  
pp. 142026 ◽  
Author(s):  
D Nikolaev ◽  
V Ternovoi ◽  
V Kim ◽  
A Shutov

Author(s):  
N. Rozhanski ◽  
V. Lifshitz

Thin films of amorphous Ni-Nb alloys are of interest since they can be used as diffusion barriers for integrated circuits on Si. A native SiO2 layer is an effective barrier for Ni diffusion but it deformation during the crystallization of the alloy film lead to the appearence of diffusion fluxes through it and the following formation of silicides. This study concerns the direct evidence of the action of stresses in the process of the crystallization of Ni-Nb films on Si and the structure of forming NiSi2 islands.


2020 ◽  
Vol 129 (3) ◽  
pp. 237-247 ◽  
Author(s):  
Hsin-An Chang ◽  
Wen-Hui Fang ◽  
Yia-Ping Liu ◽  
Nian-Sheng Tzeng ◽  
Jia-Fwu Shyu ◽  
...  

1987 ◽  
Vol 48 (C8) ◽  
pp. C8-3-C8-13 ◽  
Author(s):  
J. KUBÁT ◽  
M. RIGDAHL
Keyword(s):  

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