Quantum chemical study of the mechanism of aluminum oxide atomic layer deposition

Yuniarto Widjaja; Charles B. Musgrave

doi:10.1063/1.1473237

Quantum chemical study of the mechanism of aluminum oxide atomic layer deposition

Applied Physics Letters ◽

10.1063/1.1473237 ◽

2002 ◽

Vol 80 (18) ◽

pp. 3304-3306 ◽

Cited By ~ 136

Author(s):

Yuniarto Widjaja ◽

Charles B. Musgrave

Keyword(s):

Atomic Layer Deposition ◽

Aluminum Oxide ◽

Quantum Chemical ◽

Quantum Chemical Study ◽

Atomic Layer ◽

Chemical Study ◽

Layer Deposition

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Search for potential precursors for Si-atomic layer deposition – A quantum chemical study

Materials Letters ◽

10.1016/j.matlet.2018.01.040 ◽

2018 ◽

Vol 216 ◽

pp. 189-192 ◽

Cited By ~ 3

Author(s):

P. Vajeeston ◽

H. Fjellvåg ◽

O. Nilsen

Keyword(s):

Atomic Layer Deposition ◽

Quantum Chemical ◽

Quantum Chemical Study ◽

Atomic Layer ◽

Chemical Study ◽

Layer Deposition

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A quantum chemical study of ZrO2 atomic layer deposition growth reactions on the SiO2 surface

Surface Science ◽

10.1016/j.susc.2003.12.030 ◽

2004 ◽

Vol 550 (1-3) ◽

pp. 199-212 ◽

Cited By ~ 35

Author(s):

Joseph H. Han ◽

Guilian Gao ◽

Yuniarto Widjaja ◽

Eric Garfunkel ◽

Charles B. Musgrave

Keyword(s):

Atomic Layer Deposition ◽

Quantum Chemical ◽

Quantum Chemical Study ◽

Atomic Layer ◽

Chemical Study ◽

Sio2 Surface ◽

Layer Deposition

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Quantum chemical study of the initial surface reactions of atomic layer deposition GaAs for photonic crystal fabrication

Applied Physics Letters ◽

10.1063/1.2901880 ◽

2008 ◽

Vol 92 (11) ◽

pp. 111105 ◽

Cited By ~ 5

Author(s):

Lin Dong ◽

Qing-Qing Sun ◽

Yu Shi ◽

Han Liu ◽

Chen Wang ◽

...

Keyword(s):

Photonic Crystal ◽

Atomic Layer Deposition ◽

Quantum Chemical ◽

Surface Reactions ◽

Quantum Chemical Study ◽

Atomic Layer ◽

Chemical Study ◽

Initial Surface ◽

Layer Deposition

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Correction to “Quantum Chemical Study of the Effect of Precursor Stereochemistry on Dissociative Chemisorption and Surface Redox Reactions During the Atomic Layer Deposition of the Transition Metal Copper”

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.5b03619 ◽

2015 ◽

Vol 119 (18) ◽

pp. 10160-10160

Author(s):

Gangotri Dey ◽

Simon D. Elliott

Keyword(s):

Transition Metal ◽

Atomic Layer Deposition ◽

Quantum Chemical ◽

Redox Reactions ◽

Quantum Chemical Study ◽

Atomic Layer ◽

Chemical Study ◽

Dissociative Chemisorption ◽

Layer Deposition ◽

Surface Redox

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Quantum Chemical Study of the Effect of Precursor Stereochemistry on Dissociative Chemisorption and Surface Redox Reactions During the Atomic Layer Deposition of the Transition Metal Copper

The Journal of Physical Chemistry C ◽

10.1021/jp509334u ◽

2015 ◽

Vol 119 (11) ◽

pp. 5914-5927 ◽

Cited By ~ 8

Author(s):

Gangotri Dey ◽

Simon D. Elliott

Keyword(s):

Transition Metal ◽

Atomic Layer Deposition ◽

Quantum Chemical ◽

Redox Reactions ◽

Quantum Chemical Study ◽

Atomic Layer ◽

Chemical Study ◽

Dissociative Chemisorption ◽

Layer Deposition ◽

Surface Redox

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A Quantum Chemical Study of the Atomic Layer Deposition of Al2O3Using AlCl3and H2O as Precursors

The Journal of Physical Chemistry B ◽

10.1021/jp049762x ◽

2004 ◽

Vol 108 (18) ◽

pp. 5718-5725 ◽

Cited By ~ 52

Author(s):

Annica Heyman ◽

Charles B. Musgrave

Keyword(s):

Atomic Layer Deposition ◽

Quantum Chemical ◽

Quantum Chemical Study ◽

Atomic Layer ◽

Chemical Study ◽

Layer Deposition

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Quantum chemical study of the elementary reactions in zirconium oxide atomic layer deposition

Applied Physics Letters ◽

10.1063/1.1490415 ◽

2002 ◽

Vol 81 (2) ◽

pp. 304-306 ◽

Cited By ~ 41

Author(s):

Yuniarto Widjaja ◽

Charles B. Musgrave

Keyword(s):

Atomic Layer Deposition ◽

Zirconium Oxide ◽

Quantum Chemical ◽

Quantum Chemical Study ◽

Atomic Layer ◽

Chemical Study ◽

Elementary Reactions ◽

Layer Deposition

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Quantum chemical study of the initial surface reactions of HfO2 atomic layer deposition on the hydroxylated GaAs(001)-4×2 surface

Applied Physics Letters ◽

10.1063/1.2370425 ◽

2006 ◽

Vol 89 (16) ◽

pp. 162905 ◽

Cited By ~ 15

Author(s):

Hong-Liang Lu ◽

Min Xu ◽

Shi-Jin Ding ◽

Wei Chen ◽

David Wei Zhang ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Quantum Chemical ◽

Surface Reactions ◽

Quantum Chemical Study ◽

Atomic Layer ◽

Chemical Study ◽

Initial Surface ◽

Layer Deposition

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Quantum chemical study of the initial surface reactions in atomic layer deposition of TiN on the SiO2 surface

Journal of Physics Condensed Matter ◽

10.1088/0953-8984/18/26/013 ◽

2006 ◽

Vol 18 (26) ◽

pp. 5937-5944 ◽

Cited By ~ 1

Author(s):

Hong-Liang Lu ◽

Wei Chen ◽

Shi-Jin Ding ◽

Min Xu ◽

David Wei Zhang ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Quantum Chemical ◽

Surface Reactions ◽

Quantum Chemical Study ◽

Atomic Layer ◽

Chemical Study ◽

Initial Surface ◽

Sio2 Surface ◽

Layer Deposition

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Growth and Characteristics of ZnO Nanotube Arrays on Si Substrate by Atomic Layer Deposition in Anodic Aluminum Oxide

10.1557/proc-1109-b09-09 ◽

2008 ◽

Author(s):

Soo Jin Chua ◽

Miao Wang ◽

Han Gao ◽

Carl V. Thompson ◽

Lee Kheng Tan

Keyword(s):

Atomic Layer Deposition ◽

Aluminum Oxide ◽

Anodic Aluminum Oxide ◽

Atomic Layer ◽

Nanotube Arrays ◽

Si Substrate ◽

Anodic Aluminum ◽

Zno Nanotube ◽

Layer Deposition

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