X-ray photoelectron spectroscopy study of the role of nitrogen in FeSiAl(N) reactive sputtered films

J. E. Snyder; J. W. Anderegg

doi:10.1063/1.1453949

X-ray photoelectron spectroscopy study of the role of nitrogen in FeSiAl(N) reactive sputtered films

Journal of Applied Physics ◽

10.1063/1.1453949 ◽

2002 ◽

Vol 91 (10) ◽

pp. 8459 ◽

Cited By ~ 3

Author(s):

J. E. Snyder ◽

J. W. Anderegg

Keyword(s):

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

X Ray ◽

Sputtered Films

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Role of Interfacial Nitrogen on the High-Field Reliability of NO-Grown SiO2/6H-SiC Metal-Oxide-Semiconductor Devices: An X-Ray Photoelectron Spectroscopy Study

Advanced Science Engineering and Medicine ◽

10.1166/asem.2014.1608 ◽

2014 ◽

Vol 6 (9) ◽

pp. 1020-1023

Author(s):

C. Chakraborty ◽

C. Bose ◽

S. Chakraborty ◽

P. T. Lai

Keyword(s):

Metal Oxide ◽

Photoelectron Spectroscopy ◽

High Field ◽

Semiconductor Devices ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Spectroscopy Study ◽

X Ray ◽

Field Reliability

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The role of carbon species in heterogeneous catalytic processes: an in situ soft x-ray photoelectron spectroscopy study

Journal of Physics Condensed Matter ◽

10.1088/0953-8984/20/18/184016 ◽

2008 ◽

Vol 20 (18) ◽

pp. 184016 ◽

Cited By ~ 28

Author(s):

E M Vass ◽

M Hävecker ◽

S Zafeiratos ◽

D Teschner ◽

A Knop-Gericke ◽

...

Keyword(s):

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

X Ray ◽

Heterogeneous Catalytic ◽

Carbon Species ◽

Heterogeneous Catalytic Processes ◽

Catalytic Processes

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X-Ray Photoelectron Spectroscopy Study of Si-C Film Growth by Chemical Vapor Deposition of Ethylene on Si(100)

10.21236/ada197437 ◽

1988 ◽

Author(s):

P. A. Taylor ◽

M. Bozack ◽

W. J. Choyke ◽

J. T. Yates ◽

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Photoelectron Spectroscopy ◽

Film Growth ◽

Chemical Vapor ◽

Spectroscopy Study ◽

X Ray

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Time‐of‐flight secondary ion mass spectrometry and X‐ray photoelectron spectroscopy study of 2‐phenylimidazole on brass

Rapid Communications in Mass Spectrometry ◽

10.1002/rcm.8974 ◽

2020 ◽

Vol 35 (2) ◽

Author(s):

Matjaž Finšgar

Keyword(s):

Mass Spectrometry ◽

Photoelectron Spectroscopy ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Spectroscopy Study ◽

X Ray ◽

Ion Mass Spectrometry ◽

Secondary Ion

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A high-resolution X-ray photoelectron spectroscopy study of trifluoroacetic anhydride labelling of hydroxyl groups: demonstration of the β shift due to OC(O)CF3

Polymer ◽

10.1016/0032-3861(93)90418-a ◽

1993 ◽

Vol 34 (9) ◽

pp. 1795-1799 ◽

Cited By ~ 35

Author(s):

A.P. Ameen ◽

R.J. Ward ◽

R.D. Short ◽

G. Beamson ◽

D. Briggs

Keyword(s):

High Resolution ◽

Photoelectron Spectroscopy ◽

Trifluoroacetic Anhydride ◽

Hydroxyl Groups ◽

Spectroscopy Study ◽

X Ray

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An X-ray photoelectron spectroscopy study of the surface layers between diamond crystallites and silicon substrate deposited by microwave-plasma-assisted chemical vapour deposition

Diamond and Related Materials ◽

10.1016/0925-9635(93)90120-q ◽

1993 ◽

Vol 2 (2-4) ◽

pp. 558-561 ◽

Cited By ~ 5

Author(s):

S. Haq ◽

C. Somerton ◽

D. Tunnicliffe ◽

J.A. Savage ◽

P. John ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Silicon Substrate ◽

Photoelectron Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Spectroscopy Study ◽

Surface Layers ◽

X Ray

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Combined Time-of-Flight Secondary Ion Mass Spectrometry and X-ray Photoelectron Spectroscopy Study of the Surface Segregation of Poly(methyl methacrylate) (PMMA) in Bisphenol A Polycarbonate/PMMA Blends

Macromolecules ◽

10.1021/ma00117a038 ◽

1995 ◽

Vol 28 (13) ◽

pp. 4631-4637 ◽

Cited By ~ 52

Author(s):

J.-B. Lhoest ◽

P. Bertrand ◽

L. T. Weng ◽

J.-L. Dewez

Keyword(s):

Mass Spectrometry ◽

Bisphenol A ◽

Photoelectron Spectroscopy ◽

Surface Segregation ◽

Secondary Ion Mass Spectrometry ◽

Spectroscopy Study ◽

Bisphenol A Polycarbonate ◽

X Ray ◽

Secondary Ion ◽

Pmma Blends

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X-ray photoelectron spectroscopy study of thiols adsorbed on Pt(111) with and without the presence of a copper monolayer

Surface and Interface Analysis ◽

10.1002/1096-9918(200008)30:1<359::aid-sia819>3.0.co;2-j ◽

2000 ◽

Vol 30 (1) ◽

pp. 359-363 ◽

Cited By ~ 5

Author(s):

C. Alonso ◽

M. F. L�pez ◽

A. Guti�rrez ◽

M. L. Escudero

Keyword(s):

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

X Ray

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Oxidation of Si(100) in nitric oxide at low pressures: An x-ray photoelectron spectroscopy study

Applied Physics Letters ◽

10.1063/1.119307 ◽

1997 ◽

Vol 70 (1) ◽

pp. 63-65 ◽

Cited By ~ 44

Author(s):

A. Kamath ◽

D. L. Kwong ◽

Y. M. Sun ◽

P. M. Blass ◽

S. Whaley ◽

...

Keyword(s):

Nitric Oxide ◽

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

X Ray ◽

Low Pressures

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A transmission electron microscopy and X-ray photoelectron spectroscopy study of annealing induced γ-phase nucleation, clustering, and interfacial dynamics in reactively sputtered amorphous alumina thin films

Journal of Applied Physics ◽

10.1063/1.4916331 ◽

2015 ◽

Vol 117 (12) ◽

pp. 125307 ◽

Cited By ~ 11

Author(s):

A. K. Nanda Kumar ◽

S. Prasanna ◽

B. Subramanian ◽

S. Jayakumar ◽

G. Mohan Rao

Keyword(s):

Electron Microscopy ◽

Thin Films ◽

Transmission Electron Microscopy ◽

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

Interfacial Dynamics ◽

X Ray ◽

Transmission Electron ◽

Phase Nucleation ◽

Amorphous Alumina

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