scholarly journals Multimode quantitative scanning microwave microscopy of in situ grown epitaxial Ba1−xSrxTiO3 composition spreads

2001 ◽  
Vol 79 (26) ◽  
pp. 4411-4413 ◽  
Author(s):  
K. S. Chang ◽  
M. Aronova ◽  
O. Famodu ◽  
I. Takeuchi ◽  
S. E. Lofland ◽  
...  
Keyword(s):  
Microwave Microscopy ◽  
Scanning Microwave Microscopy

Finite-Element Modeling and Quantitative Measurement Using Scanning Microwave Microscopy to Characterize Dielectric Films

2018 ◽  
Author(s):  
K. A. Rubin ◽  
W. Jolley ◽  
Y. Yang
Keyword(s):  
Thin Films ◽  
Dielectric Film ◽  
Dielectric Constants ◽  
Dielectric Films ◽  
Silicon Substrates ◽  
Fem Modeling ◽  
Dielectric Thin Films ◽  
Microwave Microscopy ◽  
Scanning Microwave Microscopy ◽  
Low K

Abstract Scanning Microwave Impedance Microscopy (sMIM) can be used to characterize dielectric thin films and to quantitatively discern film thickness differences. FEM modeling of the sMIM response provides understanding of how to connect the measured sMIM signals to the underlying properties of the dielectric film and its substrate. Modeling shows that sMIM can be used to characterize a range of dielectric film thicknesses spanning both low-k and medium-k dielectric constants. A model system consisting of SiO2 thin films of various thickness on silicon substrates is used to illustrate the technique experimentally.

scholarly journals Progress in Traceable Nanoscale Capacitance Measurements Using Scanning Microwave Microscopy

Nanomaterials ◽  
2021 ◽  
Vol 11 (3) ◽  
pp. 820
Author(s):  
François Piquemal ◽  
José Morán-Meza ◽  
Alexandra Delvallée ◽  
Damien Richert ◽  
Khaled Kaja
Keyword(s):  
Uncertainty Budget ◽  
Dielectric Constants ◽  
Electrical Measurements ◽  
Capacitance Measurements ◽  
Uncertainty Sources ◽  
Microwave Microscopy ◽  
Calibration Methods ◽  
Combined Uncertainty ◽  
Calibration Samples ◽  
Scanning Microwave Microscopy

Reference samples are commonly used for the calibration and quantification of nanoscale electrical measurements of capacitances and dielectric constants in scanning microwave microscopy (SMM) and similar techniques. However, the traceability of these calibration samples is not established. In this work, we present a detailed investigation of most possible error sources that affect the uncertainty of capacitance measurements on the reference calibration samples. We establish a comprehensive uncertainty budget leading to a combined uncertainty of 3% in relative value (uncertainty given at one standard deviation) for capacitances ranging from 0.2 fF to 10 fF. This uncertainty level can be achieved even with the use of unshielded probes. We show that the weights of uncertainty sources vary with the values and dimensions of measured capacitances. Our work offers improvements on the classical calibration methods known in SMM and suggests possible new designs of reference standards for capacitance and dielectric traceable measurements. Experimental measurements are supported by numerical calculations of capacitances to reveal further paths for even higher improvements.

scholarly journals Improvement of spatial resolution by tilt correction in near-field scanning microwave microscopy

AIP Advances ◽  
2021 ◽  
Vol 11 (3) ◽  
pp. 035114
Author(s):  
Xianfeng Zhang ◽  
Zhe Wu ◽  
Quansong Lan ◽  
Zhiliao Du ◽  
Quanxin Zhou ◽  
...  
Keyword(s):  
Spatial Resolution ◽  
Near Field ◽  
Tilt Correction ◽  
Microwave Microscopy ◽  
Scanning Microwave Microscopy ◽  
Near Field Scanning

Quantitative Scanning Microwave Microscopy of Few-layer Platinum Diselenide

2021 ◽  
Author(s):  
Xiaopeng Wang ◽  
Kuanchen Xiong ◽  
Lei Li ◽  
James C. M. Hwang ◽  
Xin Jin ◽  
...  
Keyword(s):  
Microwave Microscopy ◽  
Scanning Microwave Microscopy
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