Metallic etching by high power Nd:yttrium–aluminum–garnet pulsed laser irradiation

2000 ◽  
Vol 71 (11) ◽  
pp. 4330 ◽  
Author(s):  
L. Torrisi ◽  
G. Ciavola ◽  
S. Gammino ◽  
L. Ando ◽  
A. Barnà ◽  
...  
1985 ◽  
Vol 56 ◽  
Author(s):  
J.T. Cheung

AbstractCdTe evaporates into Cd and Te atoms under high power, pulsed laser irradiation. The mechanism is different from thermal evaporation where only atomic Cd and molecular Te are formed. The presence of Te atoms is responsible for some unique nucleation processes, such as the epitaxial growth of CdTe on (111) CdTe substrates with either polarity and the enhancement in sticking coefficient in CdTe deposition.


1993 ◽  
Vol 3 (12) ◽  
pp. 2173-2188
Author(s):  
N. G. Chechenin ◽  
A. V. Chernysh ◽  
V. V. Korneev ◽  
E. V. Monakhov ◽  
B. V. Seleznev

1983 ◽  
Vol 44 (C5) ◽  
pp. C5-449-C5-454 ◽  
Author(s):  
P. Baeri ◽  
M. G. Grimaldi ◽  
E. Rimini ◽  
G. Celotti

1983 ◽  
Vol 44 (C5) ◽  
pp. C5-23-C5-36 ◽  
Author(s):  
H. Kurz ◽  
L. A. Lompré ◽  
J. M. Liu

Author(s):  
Nguyen Phi Long ◽  
Hiroyuki Daido ◽  
Yukihiro Matsunaga ◽  
Tomonori Yamada ◽  
Akihiro Nishimura ◽  
...  

Author(s):  
Katia del Carmen Martínez Guzmán ◽  
Sadasivan Shaji ◽  
Tushar Kanti Das Roy ◽  
Bindu Krishnan ◽  
David Avellaneda Avellaneda ◽  
...  

1982 ◽  
Vol 97 (1) ◽  
pp. 1-7 ◽  
Author(s):  
R.K. Sharma ◽  
S.K. Bansal ◽  
R. Nath ◽  
G.P. Srivastava

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