Single-crystalline silicon lift-off films for metal–oxide–semiconductor devices on arbitrary substrates

2000 ◽  
Vol 77 (4) ◽  
pp. 558-560 ◽  
Author(s):  
A. Tilke ◽  
M. Rotter ◽  
R. H. Blick ◽  
H. Lorenz ◽  
J. P. Kotthaus
Keyword(s):  
Metal Oxide ◽  
Crystalline Silicon ◽  
Semiconductor Devices ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Single Crystalline Silicon ◽  
Single Crystalline ◽  
Lift Off

Interface state‐induced shift of the oxide and semiconductor core levels for metal–oxide–semiconductor devices

1996 ◽  
Vol 80 (3) ◽  
pp. 1578-1582 ◽  
Author(s):  
H. Kobayashi ◽  
K. Namba ◽  
Y. Yamashita ◽  
Y. Nakato ◽  
T. Komeda ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Semiconductor Devices ◽  
Interface State ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor
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