Superlattice-like stacking fault and phase separation of InxGa1−xN grown on sapphire substrate by metalorganic chemical vapor deposition

2000 ◽  
Vol 77 (2) ◽  
pp. 247-249 ◽  
Author(s):  
H. K. Cho ◽  
J. Y. Lee ◽  
K. S. Kim ◽  
G. M. Yang
1999 ◽  
Vol 38 (Part 2, No. 7A) ◽  
pp. L703-L705 ◽  
Author(s):  
Takayuki Yuasa ◽  
Yoshihiro Ueta ◽  
Yuhzoh Tsuda ◽  
Atushi Ogawa ◽  
Mototaka Taneya ◽  
...  

1997 ◽  
Vol 482 ◽  
Author(s):  
E. L. Piner ◽  
N. A. El-Masry ◽  
S. X. Liu ◽  
S. M. Bedair

AbstractInGaN films in the 0–50% InN composition range have been analyzed for the occurrence of phase separation. The ñ0.5 jum thick InGaN films were grown by metalorganic chemical vapor deposition (MOCVD) in the 690 to 780°C temperature range and analyzed by θ−20 x-ray diffraction (XRD), transmission electron microscopy (TEM), and selected area diffraction (SAD). As-grown films with up to 21% InN were single phase. However, for films with 28% InN and higher, the samples showed a spinodally decomposed microstructure as confirmed by TEM and extra spots in SAD patterns that corresponded to multiphase InGaN. An explanation of the data based on the GaN-InN pseudo-binary phase diagram is discussed.


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