Maskless fabrication of field-emitter array by focused ion and electron beam

2000 ◽  
Vol 76 (22) ◽  
pp. 3319-3321 ◽  
Author(s):  
O. Yavas ◽  
C. Ochiai ◽  
M. Takai ◽  
A. Hosono ◽  
S. Okuda
1997 ◽  
Author(s):  
Heung-Woo Park ◽  
Byeong-Kwon Ju ◽  
Yun-Hi Lee ◽  
In-Byeong Kang ◽  
Noel D. Samaan ◽  
...  

Author(s):  
Hidetaka Shimawaki ◽  
Syunpei Shibuya ◽  
Hidenori Mimura ◽  
Kuniyoshi Yokoo

1998 ◽  
Vol 41-42 ◽  
pp. 453-456 ◽  
Author(s):  
M. Takai ◽  
T. Kishimoto ◽  
H. Morimoto ◽  
Y.K. Park ◽  
S. Lipp ◽  
...  

2011 ◽  
Vol 222 ◽  
pp. 209-212
Author(s):  
Yasuo Takagi ◽  
Akifumi Koike ◽  
Takahiro Fujino ◽  
Toru Aoki ◽  
Y. Neo ◽  
...  

To realize a fine focused electron beam less than several ten nm in diameter, the initial emission angle must be narrowed as much as possible. To control the initial emission angle, we have introduced a suppressor gate below the extractor gate electrode. The paper describes the fabrication of the field emitter array with a built-in suppressor gate.


Author(s):  
O. Yavas ◽  
C. Ochiai ◽  
M. Takai ◽  
Y. K. Park ◽  
C. Lehrer ◽  
...  

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