Diffuse x-ray rods and scattering from point defect clusters in ion implanted silicon

2000 ◽  
Vol 76 (19) ◽  
pp. 2698-2700 ◽  
Author(s):  
U. Beck ◽  
T. H. Metzger ◽  
J. Peisl ◽  
J. R. Patel
Keyword(s):  
Point Defect ◽  
X Ray ◽  
Defect Clusters ◽  
Point Defect Clusters ◽  
Ion Implanted

X-Ray Diffuse Scattering Investigation of Defects in Ion Implanted and Annealed Silicon

1998 ◽  
Vol 524 ◽  
Author(s):  
C. H. Chang ◽  
U. Beck ◽  
T. H. Metzger ◽  
J. R. Patel
Keyword(s):  
Ion Implantation ◽  
Point Defect ◽  
Point Defects ◽  
Diffuse Scattering ◽  
Grazing Incidence ◽  
X Rays ◽  
Scattered Intensity ◽  
X Ray ◽  
Defect Clusters ◽  
Point Defect Clusters

ABSTRACTTo characterize the point defects and point defect clusters introduced by ion implantation and annealing, we have used grazing incidence x-rays to measure the diffuse scattering in the tails of Bragg peaks (Huang Scattering). An analysis of the diffuse scattered intensity will allow us to characterize the nature of point defects or defect clusters introduced by ion implantation. We have also observed unexpected satellite peaks in the diffuse scattered tails. Possible causes for the occurrence of the peaks will be discussed.

Study of point defects in as-grown and annealed bismuth germanate single crystals

2005 ◽  
Vol 38 (3) ◽  
pp. 448-454 ◽  
Author(s):  
G. Bhagavannarayana ◽  
A. Choubey ◽  
Yu. V. Shubin ◽  
Krishan Lal
Keyword(s):  
Point Defect ◽  
Single Crystals ◽  
Point Defects ◽  
Bismuth Germanate ◽  
Cluster Radius ◽  
X Ray ◽  
Defect Clusters ◽  
X Ray Scattering ◽  
Point Defect Clusters ◽  
Ray Scattering

Point defects and their clusters in bismuth germanate single crystals free from grain boundaries and having low density of dislocations were studied by high-resolution diffuse X-ray scattering measurements. Differences in defects in the colourless crystals (type A) and the crystals having yellow tinge (type B), which were grown with different raw materials, were investigated. In addition, interesting differences in defect structures in specimens from different regions of the same boule were investigated. Specimens with diffracting surfaces along (111), (112) and (100) planes were studied. A multicrystal X-ray diffractometer employing a well collimated and highly monochromated Mo Kα1 beam and set in (+,−,−,+) configuration was employed. The diffraction curves of all the samples were quite narrow with half-widths in the range 7–11 arcsec, which are close to the theoretically expected values, if instrumental broadenings are taken into account. The observed distribution of diffuse X-ray scattering (DXS) intensity showed that not all the point defects are isolated but a significant fraction are agglomerated into clusters. Experimental data of DXS intensity were analysed by using a phenomenological model for a small concentration of dislocation loops wherein the point defects are loosely clustered with weak interactions among them. From this analysis, the cluster radius R cl, cluster volume A cl, the number of point defects within a cluster N cl and the relative concentration of the point-defect clusters among the samples were estimated. It was observed that cluster sizes do not vary from sample to sample. However, it was found that the concentration of clusters is approximately twice in the coloured sample compared with that of the colourless sample from the same boule. Annealing of the crystals at 1273 K produced an increase in point-defect clusters by a factor of ∼200. It was accompanied by a reduction in volume of clusters by a factor of ∼0.14.

Effect of displacement cascade structure and defect mobility on the growth of point defect clusters under irradiation

2006 ◽  
Vol 351 (1-3) ◽  
pp. 39-46 ◽  
Author(s):  
C.S. Becquart ◽  
A. Souidi ◽  
C. Domain ◽  
M. Hou ◽  
L. Malerba ◽  
...  
Keyword(s):  
Point Defect ◽  
Defect Clusters ◽  
Displacement Cascade ◽  
Cascade Structure ◽  
Defect Mobility ◽  
Point Defect Clusters

Point Defect Clusters and Dislocations in FIB Irradiated Nanocrystalline Aluminum Films: An Electron Tomography and Aberration-Corrected High-Resolution ADF-STEM Study

2011 ◽  
Vol 17 (6) ◽  
pp. 983-990 ◽  
Author(s):  
Hosni Idrissi ◽  
Stuart Turner ◽  
Masatoshi Mitsuhara ◽  
Binjie Wang ◽  
Satoshi Hata ◽  
...  
Keyword(s):  
High Resolution ◽  
Point Defect ◽  
Focused Ion Beam ◽  
Electron Tomography ◽  
Ion Beam ◽  
Dark Field ◽  
Internal Stresses ◽  
Defect Clusters ◽  
Point Defect Clusters ◽  
Aberration Corrected

AbstractFocused ion beam (FIB) induced damage in nanocrystalline Al thin films has been characterized using advanced transmission electron microscopy techniques. Electron tomography was used to analyze the three-dimensional distribution of point defect clusters induced by FIB milling, as well as their interaction with preexisting dislocations generated by internal stresses in the Al films. The atomic structure of interstitial Frank loops induced by irradiation, as well as the core structure of Frank dislocations, has been resolved with aberration-corrected high-resolution annular dark-field scanning TEM. The combination of both techniques constitutes a powerful tool for the study of the intrinsic structural properties of point defect clusters as well as the interaction of these defects with preexisting or deformation dislocations in irradiated bulk or nanostructured materials.

Sign in / Sign up

Export Citation Format

Share Document