Low-energy grazing-angle argon-ion irradiation of silicon: A viable option for cleaning?

2000 ◽  
Vol 76 (14) ◽  
pp. 1887-1889 ◽  
Author(s):  
P. C. Zalm ◽  
J. A. van den Berg ◽  
J. G. M. van Berkum ◽  
P. Bailey ◽  
T. C. Q. Noakes
Keyword(s):  
Ion Irradiation ◽  
Grazing Angle ◽  
Low Energy ◽  
Viable Option ◽  
Argon Ion

Anatase TiO2-based two-dimensional electron gases generated by low-energy argon-ion irradiation

2018 ◽  
Vol 112 (24) ◽  
pp. 241601
Author(s):  
Xi Yan ◽  
Hongrui Zhang ◽  
Hui Zhang ◽  
Tahira Khan ◽  
Jine Zhang ◽  
...  
Keyword(s):  
Ion Irradiation ◽  
Anatase Tio2 ◽  
Low Energy ◽  
Two Dimensional ◽  
Dimensional Electron ◽  
Electron Gases ◽  
Argon Ion

Investigation of the surface chemistry of Teflon. 1. Effect of low energy argon ion irradiation on surface structure

Langmuir ◽  
1993 ◽  
Vol 9 (3) ◽  
pp. 740-748 ◽  
Author(s):  
Beng Jit Tan ◽  
Mebrahtu Fessehaie ◽  
Steven L. Suib
Keyword(s):  
Surface Chemistry ◽  
Surface Structure ◽  
Ion Irradiation ◽  
Low Energy ◽  
Argon Ion

Low energy argon ion irradiation surface effects on triglycine sulfate

2013 ◽  
Vol 280 ◽  
pp. 858-861
Author(s):  
Carmen Aragó ◽  
José L. Plaza ◽  
Manuel I. Marqués ◽  
Julio A. Gonzalo
Keyword(s):  
Ion Irradiation ◽  
Surface Effects ◽  
Low Energy ◽  
Triglycine Sulfate ◽  
Argon Ion

scholarly journals Structural changes induced by argon ion irradiation in TiN thin films

2011 ◽  
Vol 5 (1) ◽  
pp. 19-23 ◽  
Author(s):  
Maja Popovic ◽  
Mirjana Novakovic ◽  
Zlatko Rakocevic ◽  
Natasa Bibic
Keyword(s):  
Thin Films ◽  
Structural Changes ◽  
Ion Irradiation ◽  
Grazing Angle ◽  
Film Structure ◽  
Cross Sectional ◽  
Force Microscopy ◽  
Transmission Electron ◽  
Tin Thin Films ◽  
Argon Ion

In this work, the effects of 120 keV Ar+ ion implantation on the structural properties of TiN thin films were investigated. TiN layers were deposited by d.c. reactive sputtering on Si(100) wafers at room temperature or at 150?C. The thickness of TiN layers was ~240 nm. After deposition the samples were irradiated with 120 keV argon ions to the fluencies of 1?1015 and 1?1016 ions/cm2. Structural characterization was performed with Rutherford backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (XTEM), grazing angle X-ray diffraction (XRD) and atomic force microscopy (AFM). It was found that the argon ion irradiation induced the changes in the lattice constant, mean grain size, micro-strain and surface morphology of the TiN layers. The observed micro-structural changes are due to the formation of the high density damage region in the TiN thin film structure.

Low energy argon ion irradiation effect on magnetic behavior of polycrystalline Cu substituted ZnO

2020 ◽  
Author(s):  
Shreenu Pattanaik ◽  
Jyoshnarani Mohapatra ◽  
Dilip Kumar Mishra ◽  
Pravin Kumar ◽  
D. Kanjilal
Keyword(s):  
Ion Irradiation ◽  
Magnetic Behavior ◽  
Low Energy ◽  
Irradiation Effect ◽  
Argon Ion

Improvement and Evaluation of Metal Thin Films by Very Low Energy Argon Ion Irradiation

2004 ◽  
Author(s):  
Tomonori Sasaki ◽  
Ming Yang ◽  
Kinuko Fujimoto
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Ion Irradiation ◽  
Metal Films ◽  
Low Energy ◽  
Metal Thin Films ◽  
Ion Plasma ◽  
Integrated Intensity ◽  
Argon Ion

A new methodology using very low energy Ar ion irradiation is proposed to improve the mechanical properties of thin metal films deposited by sputtering. In this study, accelerating voltage of Ar ion plasma was set to lower than 100V, and several conditions were applied to irradiations. Consequently, it is found that Young’s modulus and hardness of Aluminum and Nickel thin film increases about 10% by the irradiation compared with a non-irradiated thin film. (111)–oriented integrated intensity of diffraction of Al and Ni thin film was increased by the irradiation. It is considered that crystalline orientation was changed and column spacing of the film be filled by the irradiation. It is shown that the proposed technique is effective to improve the mechanical properties of metal thin films with proper irradiation conditions.

Reduction of graphene oxide using low energy (40 keV) argon ion irradiation

2020 ◽  
Author(s):  
Ashish B. Thorat ◽  
M. S. Taware ◽  
V. D. Bharud ◽  
S. D. Dhole ◽  
S. S. Dahiwale
Keyword(s):  
Graphene Oxide ◽  
Ion Irradiation ◽  
Low Energy ◽  
Argon Ion
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