Surface polarity dependence of Mg doping in GaN grown by molecular-beam epitaxy

2000 ◽  
Vol 76 (13) ◽  
pp. 1740-1742 ◽  
Author(s):  
L. K. Li ◽  
M. J. Jurkovic ◽  
W. I. Wang ◽  
J. M. Van Hove ◽  
P. P. Chow
2005 ◽  
Vol 278 (1-4) ◽  
pp. 443-448 ◽  
Author(s):  
A. Feduniewicz ◽  
C. Skierbiszewski ◽  
M. Siekacz ◽  
Z.R. Wasilewski ◽  
I. Sproule ◽  
...  

2020 ◽  
Vol 50 (2) ◽  
Author(s):  
Krzesimir Nowakowski-Szkudlarek ◽  
Grzegorz Muziol ◽  
Mikolaj Żak ◽  
Mateusz Hajdel ◽  
Marcin Siekacz ◽  
...  

We investigated the influence of the In0.17Ga0.83N:Mg contact layer grown by plasma assisted molecular beam epitaxy on the resistivity of p-type Ni/Au contacts. We demonstrate that the Schottky barrier width for p-type contact is less than 5 nm. We compare circular transmission line measurements with a p-n diode current-voltage characteristics and show that discrepancies between these two methods can occur if surface quality is deteriorated. It is found that the most efficient contacts to p-type material consist of In0.17Ga0.83N:Mg contact layer with Mg doping level as high as 2 × 1020 cm–3.


2021 ◽  
Vol 130 (23) ◽  
pp. 235301
Author(s):  
Akhil Mauze ◽  
Yuewei Zhang ◽  
Takeki Itoh ◽  
Thomas E. Mates ◽  
Hartwin Peelaers ◽  
...  

2006 ◽  
Vol 291 (1) ◽  
pp. 60-65 ◽  
Author(s):  
C.X. Gao ◽  
F.C. Yu ◽  
A.R. Choi ◽  
D.J. Kim ◽  
C.G. Kim ◽  
...  

1997 ◽  
Vol 71 (21) ◽  
pp. 3111-3113 ◽  
Author(s):  
F. Hamdani ◽  
A. E. Botchkarev ◽  
H. Tang ◽  
W. Kim ◽  
H. Morkoç

Author(s):  
H. Limborço ◽  
F. M. Matinaga ◽  
M. I. N. da Silva ◽  
O. de Melo ◽  
E. R. Viana ◽  
...  

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