Effects of interfacial layer growth on the electrical characteristics of thin titanium oxide films on silicon

1999 ◽  
Vol 74 (21) ◽  
pp. 3143-3145 ◽  
Author(s):  
Byoung Hun Lee ◽  
Yongjoo Jeon ◽  
Keith Zawadzki ◽  
Wen-Jie Qi ◽  
Jack Lee
2013 ◽  
Vol 566 ◽  
pp. 149-152
Author(s):  
Tatsunori Kakuda ◽  
Tomoaki Futakuchi

We evaluated the surface area, pore size distribution, and electrical characteristics of titanium oxide films formed under different sintering and cleaning conditions. In addition, we examined the microstructure of the titanium oxide films by forming cross-sectional surfaces. The necking structure of the titanium oxide films strongly influenced the conversion efficiency of the dye-sensitized solar cell. And, the conversion efficiency was improved by the increasing firing temperature and treating with TiCl4 and ozone water.


2001 ◽  
Vol 40 (Part 2, No. 10A) ◽  
pp. L1054-L1057 ◽  
Author(s):  
Yo Ichikawa ◽  
Kentaro Setsune ◽  
Syun-ichiro Kawashima ◽  
Koichi Kugimiya

1997 ◽  
Vol 310 (1-2) ◽  
pp. 29-33 ◽  
Author(s):  
Feng Zhang ◽  
S. Jin ◽  
Yingjun Mao ◽  
Zhihong Zheng ◽  
Yu Chen ◽  
...  

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