In situelectron-spin-resonance measurements of film growth of hydrogenated amorphous silicon

1997 ◽  
Vol 70 (9) ◽  
pp. 1137-1139 ◽  
Author(s):  
Satoshi Yamasaki ◽  
Takahide Umeda ◽  
Junichi Isoya ◽  
Kazunobu Tanaka
Keyword(s):  
Amorphous Silicon ◽  
Film Growth ◽  
Hydrogenated Amorphous Silicon ◽  
Spin Resonance ◽  
Hydrogenated Amorphous

Properties of Catalytic-Cvd Amorphous Silicon-Germanium (a-SiGe:H)

1990 ◽  
Vol 192 ◽  
Author(s):  
Hideki Matsumura ◽  
Masaaki Yamaguchi ◽  
Kazuo Morigaki
Keyword(s):  
Amorphous Silicon ◽  
Silicon Germanium ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
Characteristic Energy ◽  
Optical Band Gaps ◽  
Spin Resonance ◽  
Amorphous Silicon Germanium ◽  
Conductive Properties ◽  
Hydrogenated Amorphous

ABSTRACTHydrogenated amorphous silicon-germanium (a-SiGe:H) films are prepared by the catalytic chemical vapor deposition (Cat-CVD) method using a SiH4, GeH4 and H4 gas mixture. Properties of the films are investigated by the photo-thermal deflection spectroscopy (PDS) and electron spin resonance (ESR) measurements, in addition to the photo-conductive and structural studies. It is found that the characteristic energy of Urbach tail, ESR spin density and other photo-conductive properties of Cat-CVD a-SiGe:H films with optical band gaps around 1.45 eV are almost equivalent to those of the device quality glow discharge hydrogenated amorphous silicon (a-Si:H).

Reduction of the Defect Density in a-Si:H Deposited at ≤250°C

1993 ◽  
Vol 297 ◽  
Author(s):  
Hitoshi Nishio ◽  
Gautam Ganguly ◽  
Akihisa Matsuda
Keyword(s):  
Diffusion Coefficient ◽  
Amorphous Silicon ◽  
Surface Diffusion ◽  
Film Growth ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Device Fabrication ◽  
Surface Diffusion Coefficient ◽  
Hydrogenated Amorphous ◽  
Substrate Temperatures

We present a method to reduce the defect density in hydrogenated amorphous silicon (a-Si:H) deposited at low substrate temperatures similar to those used for device fabrication . Film-growth precursors are energized by a heated mesh to enhance their surface diffusion coefficient and this enables them to saturate more surface dangling bonds.

Stability in Amorphous Silicon

1987 ◽  
Vol 95 ◽  
Author(s):  
Z E. Smith ◽  
S. Wagner
Keyword(s):  
Electron Spin Resonance ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Thermal Recovery ◽  
Defect States ◽  
Spin Resonance ◽  
Resonance Data ◽  
Electron Spin Resonance Data ◽  
Gap States ◽  
Hydrogenated Amorphous

AbstractThe experimental phenomena associated with light-induced degradation and thermal recovery of hydrogenated amorphous silicon (a-Si:H) films are reviewed, with special emphasis on the limitations of each experimental technique. When several techniques are used in concert, a fuller picture emerges. Recent experiments suggest different positions in the band-gap of the paramagnetic-associated defect states (the dangling bonds) for doped and undopedfilms; this information can be combined with conductivity, sub-bandgap optical absorption and electron spin resonance data to yield a model for the density of gap states (DOS) in a- Si:H, including how the DOS changes upon illumination and annealing.

scholarly journals Anisotropy in Hydrogenated Amorphous Silicon Films as Observed Using Polarized Ftir-Atr Spectroscopy

1999 ◽  
Vol 557 ◽  
Author(s):  
J. D. Webb ◽  
L. M. Gedvilas ◽  
R. S. Crandall ◽  
E. Iwaniczko ◽  
B. P. Nelson ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Film Growth ◽  
Crystalline Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Impurity Band ◽  
Attenuated Total Reflection ◽  
Structural Anisotropy ◽  
Si Films ◽  
Polarized Ftir ◽  
Hydrogenated Amorphous

AbstractWe used polarized attenuated total reflection (ATR) measurements together with Fourier transform infrared (FTIR) spectroscopy to investigate the vibrational spectra of hydrogenated amorphous silicon (a-SiHx) films 0.5-1.0 microns in thickness. We deposited the films using hot-wire or plasma-enhanced chemical vapor deposition methods (HWCVD or PECVD, respectively) on crystalline silicon and cadmium telluride substrates. Our ATR technique gave a spectral range from 2100-400 cm-1, although the Si-H wagging mode absorption band at 640 cm-1 was somewhat distorted in the a-SiHx/Si samples by impurity and lattice absorption in the silicon ATR substrates. We report the identification of a Si-O-C impurity band with maximum intensity at 1240-1230 cm-1. The assignment of this band to a Si-O-C vibration is supported by secondary-ion mass spectrometry (SIMS) measurements. Our polarized FTIR-ATR spectra of HWCVD and PECVD a-SiHx films on <111> Si ATR substrates show that the impurity dipoles are oriented strongly parallel to the film growth direction. The wagging mode absorbance band is more intense in the film plane. This trend is less pronounced for the Si-H stretching vibrations. These observations are consistent with some degree of anisotropy or medium-range order in the films. The anisotropy in the Si-H bands may be related to residual stress in the films. Our scanning electron microscopy (SEM) analyses of the samples offer additional evidence of bulk structural anisotropy in the a-SiHx/Si films. However, the Si-O-C impurity band was not observed in the polarized ATR-FTIR spectra of the a-SiHx/CdTe samples, thus indicating that the Si substrates influence formation of the impurity in the a-SiHx/Si films.

Defects in Hydrogenated Amorphous Silicon Carbide Alloys using Electron Spin Resonance and Photothermal Deflection Spectroscopy

2009 ◽  
Vol 1153 ◽  
Author(s):  
Brian J. Simonds ◽  
Feng Zhu ◽  
Josh Gallon ◽  
Jian Hu ◽  
Arun Madan ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Electron Spin Resonance ◽  
Amorphous Silicon ◽  
Electron Spin ◽  
Carbon Concentration ◽  
Hydrogenated Amorphous Silicon ◽  
Photothermal Deflection Spectroscopy ◽  
Spin Resonance ◽  
Photothermal Deflection ◽  
Hydrogenated Amorphous

AbstractHydrogenated amorphous silicon carbide alloys are being investigated as a possible top photoelectrode in photoelectrochemical cells used for hydrogen production through water splitting. In order to be used as such, it is important that the effects of carbon concentration on bonding, and thus on the electronic and optical properties, is well understood. Electron spin resonance experiments were performed under varying experimental conditions to study the defect concentrations. The dominant defects are silicon dangling bonds. At room temperature, the spin densities varied between 1016 and 1018 spins/cm3 depending on the carbon concentration. Photothermal deflection spectroscopy, which is an extremely sensitive measurement of low levels of absorption in thin films, was performed to investigate the slope of the Urbach tail. These slopes are 78 meV for films containing the lowest carbon concentration and 98 meV for those containing the highest carbon concentration.

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