Depth analysis of phase formation in Si after high-dose Fe ion implantation by depth-selective conversion-electron Mössbauer spectroscopy

1997 ◽  
Vol 70 (20) ◽  
pp. 2696-2698 ◽  
Author(s):  
S. Kruijer ◽  
W. Keune ◽  
M. Dobler ◽  
H. Reuther
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