Equilibrium tunneling between two‐dimensional and quasi‐one‐dimensional electron gases in devices fabricated by in situ focused ion beam lithography

1996 ◽  
Vol 68 (6) ◽  
pp. 826-828 ◽  
Author(s):  
B. Kardynal/ ◽  
E. H. Linfield ◽  
D. A. Ritchie ◽  
K. M. Brown ◽  
C. H. W. Barnes ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Two Dimensional ◽  
Dimensional Electron ◽  
Electron Gases ◽  
One Dimensional ◽  
Ion Beam Lithography

Fabrication of high-quality two-dimensional electron gases by overgrowth of focused-ion-beam-doped AlxGa1−xAs

2003 ◽  
Vol 82 (3) ◽  
pp. 481-483 ◽  
Author(s):  
D. Reuter ◽  
C. Riedesel ◽  
P. Schafmeister ◽  
C. Meier ◽  
A. D. Wieck
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Two Dimensional ◽  
Dimensional Electron ◽  
High Quality ◽  
Electron Gases

Fabrication of Sub-250nm High Aspect Ratio Apertures by Focused Ion Beam Lithography

2006 ◽  
Vol 983 ◽  
Author(s):  
Todd Simpson ◽  
Ian V Mitchell
Keyword(s):  
Silicon Nitride ◽  
High Resolution ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Gold Films ◽  
Ion Beam Lithography ◽  
Diameter Hole ◽  
Sem Imaging ◽  
Aperture Arrays

AbstractAperture arrays were fabricated in 1.0µm thick gold films supported on 20nm thick silicon nitride membranes. Lithographic milling strategies in gold were evaluated through the use of in-situ sectioning and high resolution SEM imaging with the UWO CrossBeam FIB/SEM. A successful strategy for producing a 250nm diameter hole with sidewalls approaching vertical is summarized.

Two-dimensional electron gases in MgZnO/ZnO and ZnO/MgZnO/ZnO heterostructures grown by dual ion beam sputtering

2018 ◽  
Vol 51 (13) ◽  
pp. 13LT02 ◽  
Author(s):  
Rohit Singh ◽  
Md Arif Khan ◽  
Pankaj Sharma ◽  
Myo Than Htay ◽  
Abhinav Kranti ◽  
...  
Keyword(s):  
Ion Beam ◽  
Two Dimensional ◽  
Dimensional Electron ◽  
Ion Beam Sputtering ◽  
Electron Gases ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering
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