Work function of indium tin oxide transparent conductor measured by photoelectron spectroscopy

1996 ◽  
Vol 68 (19) ◽  
pp. 2699-2701 ◽  
Author(s):  
Y. Park ◽  
V. Choong ◽  
Y. Gao ◽  
B. R. Hsieh ◽  
C. W. Tang
2002 ◽  
Vol 747 ◽  
Author(s):  
H. H. Fong ◽  
W. J. Song ◽  
S. K. So

ABSTRACTThe surface properties of indium-tin-oxide (ITO) thin films treated by UV ozone or plasma were analyzed by angular dependent X-ray photoelectron spectroscopy (ADXPS) and by ultraviolet photoemission (UPS). The chemical composition, chemical states and the work function of the ITO surfaces were deduced. Our analysis indicate that ITO surface is Sn-rich. Both UV ozone and O-plasma treatments are most effective in removing surface hydrocarbon. Among all treatments, O-plasma treated surface achieved the highest work function of 4.4eV, whereas argon ion sputtered surface had the lowest work function of 3.9eV. Both O-plasma and UV ozone treatments increase the surface oxygen concentration. It is proposed that O2-ions diffuse into ITO. The diffusion length is about 50Å as deduced from ADXPS. The stoichiometry of the surface is the major factor in controlling the surface work function of ITO. A surface band bending model is proposed to account for the change of work function due to “oxidized” ITO surface after UV-ozone or oxygen plasma treatments.


Crystals ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 645
Author(s):  
Myung-Gyun Baek ◽  
Johng-Eon Shin ◽  
Dong-Hyun Hwang ◽  
Sung-Hoon Kim ◽  
Hong-Gyu Park ◽  
...  

Herein, we examined changes in the interfacial properties of organic light-emitting diodes when n-decyltrimethoxysilane (CH3SAM) was deposited on the surface of an indium tin oxide (ITO) electrode for various deposition times. It was revealed that the interfacial properties varied with deposition time. As the latter increased, so did the measured value of the contact angle, and ITO substrate exhibited a lower wettability. The contact angle measurements for bare ITO at 1, 10, 30, and 90 min were 57.41°, 63.43°, 73.76°, 81.47°, respectively, and the highest value obtained was 93.34°. In addition, the average roughness and work function of the ITO were measured using atomic force microscopy and X-ray photoelectron spectroscopy. As the deposition time of CH3SAM on the ITO substrates increased, it was evident that the former was well aligned with the latter, improving surface modification. The work function of CH3SAM, modified on the ITO substrates, improved by approximately 0.11 eV from 5.05–5.16 eV. The introduction of CH3SAM to the ITO revealed the ease of adjustment of the characteristics of ITO substrates.


2005 ◽  
Vol 484 (1-2) ◽  
pp. 272-277 ◽  
Author(s):  
Akihiko Nakasa ◽  
Mami Adachi ◽  
Eiji Suzuki ◽  
Hisanao Usami ◽  
Hitoshi Fujimatsu ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document