Erratum: ‘‘Novel semiconductor substrate formed by hydrogen ion implantation into silicon’’ [Appl. Phys. Lett. 55, 2223 (1989)]

1995 ◽  
Vol 67 (3) ◽  
pp. 444-444 ◽  
Author(s):  
Jianming Li
2019 ◽  
Vol 34 (1) ◽  
pp. 1159-1164
Author(s):  
Yu Cheng Hsiao ◽  
Jenq-Horng Liang ◽  
Chih-Ming Lin

2002 ◽  
Vol 36 (5) ◽  
pp. 568-573 ◽  
Author(s):  
V. R. Galakhov ◽  
I. V. Antonova ◽  
S. N. Shamin ◽  
V. I. Aksenova ◽  
V. I. Obodnikov ◽  
...  

AIP Advances ◽  
2020 ◽  
Vol 10 (1) ◽  
pp. 015045
Author(s):  
C.-M. Lim ◽  
Z. Zhao ◽  
K. Sumita ◽  
K. Toprasertpong ◽  
M. Takenaka ◽  
...  

1994 ◽  
Vol 211 (2) ◽  
pp. 127-134 ◽  
Author(s):  
A.A. Pisarev ◽  
S.K. Zhdanov ◽  
O.V. Ogorodnikova

2006 ◽  
Vol 6 (3) ◽  
pp. 495-498 ◽  
Author(s):  
J. Kennedy ◽  
A. Markwitz ◽  
Z. Li ◽  
W. Gao ◽  
C. Kendrick ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document