Characteristics of a two‐component chemically‐assisted ion‐beam etching technique for dry‐etching of high‐speed multiple quantum well laser mirrors
1992 ◽
Vol 4
(7)
◽
pp. 673-675
◽
Keyword(s):
1998 ◽
1997 ◽
Vol 9
(2)
◽
pp. 164-166
◽
Keyword(s):
2012 ◽
Vol 24
(17)
◽
pp. 1561-1563
◽
1997 ◽
Vol 3
(2)
◽
pp. 315-319
◽