Helicon plasma sputtering system for fabrication of multilayer x‐ray mirrors

1995 ◽  
Vol 66 (2) ◽  
pp. 2141-2143 ◽  
Author(s):  
Masaki Koike ◽  
Mitsukuni Chiwaki ◽  
Isao H. Suzuki ◽  
Naoto Kobayashi
Keyword(s):  
Helicon Plasma ◽  
X Ray ◽  
Plasma Sputtering ◽  
Sputtering System

scholarly journals Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution

Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 599
Author(s):  
Handan Huang ◽  
Li Jiang ◽  
Yiyun Yao ◽  
Zhong Zhang ◽  
Zhanshan Wang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Multilayer Film ◽  
Thickness Distribution ◽  
Parabolic Cylinder ◽  
Particle Model ◽  
Planetary Motion ◽  
X Rays ◽  
X Ray ◽  
Sputtering System

The laterally graded multilayer collimator is a vital part of a high-precision diffractometer. It is applied as condensing reflectors to convert divergent X-rays from laboratory X-ray sources into a parallel beam. The thickness of the multilayer film varies with the angle of incidence to guarantee every position on the mirror satisfies the Bragg reflection. In principle, the accuracy of the parameters of the sputtering conditions is essential for achieving a reliable result. In this paper, we proposed a precise method for the fabrication of the laterally graded multilayer based on a planetary motion magnetron sputtering system for film thickness control. This method uses the fast and slow particle model to obtain the particle transport process, and then combines it with the planetary motion magnetron sputtering system to establish the film thickness distribution model. Moreover, the parameters of the sputtering conditions in the model are derived from experimental inversion to improve accuracy. The revolution and rotation of the substrate holder during the final deposition process are achieved by the speed curve calculated according to the model. Measurement results from the X-ray reflection test (XRR) show that the thickness error of the laterally graded multilayer film, coated on a parabolic cylinder Si substrate, is less than 1%, demonstrating the effectiveness of the optimized method for obtaining accurate film thickness distribution.

scholarly journals Properties and Analysis of Transparency Conducting AZO Films by Using DC Power and RF Power Simultaneous Magnetron Sputtering

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
Neng-Fu Shih ◽  
Jin-Zhou Chen ◽  
Yeu-Long Jiang
Keyword(s):  
Incident Light ◽  
Blue Shift ◽  
Light Wavelength ◽  
Rf Power ◽  
X Ray Diffraction ◽  
X Ray ◽  
Dc Power ◽  
Incident Light Wavelength ◽  
Significant Blue Shift ◽  
Sputtering System

DC power and RF power were introduced into the magnetic controlled sputtering system simultaneously to deposit AZO films in order to get an acceptable deposition rate with high quality transparency conducting thin film. The resistivity decreases with the RF power for the as-deposited samples. The resistivity of 6 × 10−4 Ω-cm and 3.5–4.5 × 10−4 Ω-cm is obtained for the as-deposited sample, and for all annealed samples, respectively. The transmittance of the AZO films with higher substrate temperature is generally above 80% for the incident light wavelength within 400–800 nm. The transmittance of the as-deposited samples reveals a clear blue shift phenomenon. The AZO films present (002) oriented preference as can be seen from the X-ray diffraction curves. All AZO films reveal compressive stress. The annealing process improves the electrical property of AZO films. A significant blue shift phenomenon has been found, which may have a great application for electrode in solar cell.

scholarly journals INFLUENCE OF ELECTRIC FIELD ON ADHESION AND STRUCTURE OF CONDUCTING FILMS ON DIELECTRIC SUBSTANCES

2017 ◽  
Vol 60 (8) ◽  
pp. 100 ◽  
Author(s):  
Nikolai S. Pshchelko ◽  
Ekaterina G. Vodkailo ◽  
Vladimir V. Tomaev ◽  
Boris D. Klimenkov ◽  
Veniamin L. Koshevoi ◽  
...  
Keyword(s):  
Electric Field ◽  
Dielectric Substrate ◽  
Zno Films ◽  
Electric Voltage ◽  
X Ray ◽  
Dry Air ◽  
Glass Substrates ◽  
Plasma Sputtering ◽  
Air Atmosphere ◽  
Extended Surface

Some results are provided confirming that modifying of the zinc films fabricated on glass substrates by a resulting effect of heat treatment in an atmosphere of dry air and action of cross electric field is possible. Using scanning electron microscopy (measured with the Zeiss Merlin microscope) the surface morphology of the films was studied. Also, the elemental composition of the films by micro-X-ray spectral analysis was studied. On the glass substrates, by the method of vacuum thermal evaporation, zinc films (Zn) with thickness of ~ 500 nm were obtained. In order to form ZnO films, the original films were treated at 250 °C in a dry air atmosphere, and in another case - in addition to the sample a transverse electric field with a potential of 300 V was applied. Platinum films on the silicon dioxide layer were obtained using the method of the ion-plasma sputtering. These layers were investigated by X-ray phase analysis, electron and atomic force microscopy. The thickness of platinum layers was 50 and 100 nm. During the deposition (deposition temperature – 300 °C, deposition rate - 5 nm / min), applied voltage between the platinum film and the silicon plate was 5 V. The films, obtained by applying a biasing, showed a more homogeneous fine-grained structure and a higher rate of growth than the original samples.  In this way ZnO films can be manufactured with the extended surface. The possibility of significant changes caused by electric field use in adhesion, structure and conductive properties of the coatings is discussed. The method of depositing platinum on a dielectric substrate with an additional electrostatic field is also substantiated. It is shown that the application of an electric voltage to the film leads to a significant change in the structure of the resulting coating.Forcitation:Pshchelko N.S., Vodkailo E.G., Tomaev V.V., Klimenkov B.D., Koshevoi V.L., Belorus A.O. Influence of electric field on adhesion and structure of conducting films on dielectric substances. Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol. 2017. V. 60. N 8. P. 100-104.

Structural, Optical, and Electrical Properties of ZnO/Nb/ZnO Multilayer Thin Films

2014 ◽  
Vol 975 ◽  
pp. 238-242 ◽  
Author(s):  
Adolfo Henrique Nunes Melo ◽  
Petrucio Barrozo Silva ◽  
Marcelo Andrade Macedo
Keyword(s):  
Thin Films ◽  
Peak Position ◽  
Multilayer Thin Films ◽  
Optical And Electrical Properties ◽  
Zno Thin Film ◽  
Energy Band Gap ◽  
X Ray ◽  
Unit Cell Size ◽  
Vis Spectroscopy ◽  
Sputtering System

ZnO multilayers and pure ZnO thin films were deposited onto glass using a sputtering system, and were subsequently characterized by X-ray diffractometry and UV-Vis spectroscopy. The resistivity of the samples was measured by the four-probe method. All films exhibited preferential orientation along the c-axis and the peak position (002) shifted to a lower position, indicating a reduction in the unit cell size. The pure ZnO thin film exhibited a maximum transmittance of approximately 98%, which decreased as the Nb layer increased, thus increasing the absorbance of the multilayer thin films. The energy band gap decreased as the thickness of the metal increased which higher value was 3.18 eV. The resistivity had a minimum of 0.1 × 10-4 Ω m.

Ajustement par recuits rapides RTA (rapid thermal annealing) des contraintes dans des couches minces de tungstène utilisées comme absorbant pour des masques à rayons X

1991 ◽  
Vol 69 (3-4) ◽  
pp. 451-455 ◽  
Author(s):  
H. Lafontaine ◽  
J. F. Currie ◽  
S. Boily ◽  
M. Chaker ◽  
H. Pépin
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Annealing Temperature ◽  
Rf Power ◽  
X Ray ◽  
Stress Changes ◽  
Different Temperatures ◽  
Absorbing Layer ◽  
Good Agreement ◽  
Sputtering System

Tungsten thin films are deposited with a triode sputtering system in order to obtain an absorbing layer for X-ray masks. The mechanical stress is studied as a function of different pressure and RF power conditions during deposition. Rapid thermal annealing at different temperatures and durations is performed in order to produce films under low compressive stress. We observe that the stress changes occur over the time scale of seconds at the annealing temperature and that the corresponding activation energies are low (60 meV). Grain growth in a preferred orientation explains the observed changes in stress. The magnitude in the change of stress is in good agreement with a model proposed by Hoffman et al. relating the stress to grain size and grain boundary dimensions. [Journal translation]

Application of V2O5 in Thin Film Microbatteries Prepared by RF Magnetron Sputtering

2009 ◽  
Vol 79-82 ◽  
pp. 931-934 ◽  
Author(s):  
Liang Tang Zhang ◽  
Jie Song ◽  
Quan Feng Dong ◽  
Sun Tao Wu
Keyword(s):  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Unit Area ◽  
Rf Magnetron Sputtering ◽  
Micro Electro Mechanical System ◽  
X Ray Diffraction ◽  
X Ray ◽  
Mems Technology ◽  
Surface Morphologies ◽  
Sputtering System

The polycrystalline V2O5 films as the anode in V2O5 /LiPON /LiCoO2 lithium microbattary were prepared by RF magnetron sputtering system. The V2O5 films’ crystal structures, surface morphologies and composition were characterized and analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The microbatteries were fabricated by micro electro-mechanical system (MEMS) technology. The battery active unit area is 500μm×500μm, and the thickness of V2O5, LiPON and LiCoO2 films was estimated to be 200, 610, and 220nm, respectively. The discharge volumetric capacity is between 9.36μAhcm-2μm-1 and 9.63μAhcm-2μm-1 after 40 cycles.

Fabrication and characterization of multilayer supermirrors for hard X-ray optics

1998 ◽  
Vol 5 (3) ◽  
pp. 711-713 ◽  
Author(s):  
K. Yamashita ◽  
K. Akiyama ◽  
K. Haga ◽  
H. Kunieda ◽  
G. S. Lodha ◽  
...  
Keyword(s):  
Energy Band ◽  
Incidence Angle ◽  
Grazing Angle ◽  
Float Glass ◽  
Optical Systems ◽  
X Ray ◽  
Dc Sputtering ◽  
Fabrication And Characterization ◽  
Sputtering System

Multilayer supermirrors stacked with three sets of Pt/C combinations have been fabricated on a flat float-glass and conical replica foil mirror using a magnetron DC sputtering system, and applied to X-ray optical systems in the hard X-ray region. The design of the supermirror is optimized to obtain the highest integrated reflectivity in the energy band and at the grazing angle concerned. X-ray reflectivities of 30% in the 25–35 keV band at an incidence angle of 0.3° were obtained.

Microstructure and optical properties of amorphous TiO2-SiO2 composite films synthesized by helicon plasma sputtering

1999 ◽  
Vol 338 (1-2) ◽  
pp. 105-109 ◽  
Author(s):  
Xinrong Wang ◽  
Hiroshi Masumoto ◽  
Yoshihiro Someno ◽  
Toshio Hirai
Keyword(s):  
Optical Properties ◽  
Composite Films ◽  
Helicon Plasma ◽  
Plasma Sputtering ◽  
Amorphous Tio2

Ti/Al multilayer zone plate and Bragg–Fresnel lens

1998 ◽  
Vol 5 (3) ◽  
pp. 794-796 ◽  
Author(s):  
M. Koike ◽  
I. H. Suzuki ◽  
S. Komiya ◽  
Y. Amemiya
Keyword(s):  
Fresnel Lens ◽  
Zone Plate ◽  
Helicon Plasma ◽  
Layer Width ◽  
Outermost Layer ◽  
One Dimensional ◽  
Plasma Sputtering

By using a helicon plasma sputtering technique, a one-dimensional Ti/Al multilayer zone plate with an outermost layer width of 76 nm has been successfully fabricated. A Bragg–Fresnel lens has been made by combining this zone plate with a Ge(422) crystal. Comparison of the Ti/Al multilayer zone plate with the Ag/Al zone plate is discussed in terms of focusing efficiency.

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