scholarly journals Design and performance of the Advanced Light Source double‐crystal monochromator

1995 ◽  
Vol 66 (2) ◽  
pp. 1748-1750 ◽  
Author(s):  
G. Jones ◽  
S. Ryce ◽  
D. W. Lindle ◽  
B. A. Karlin ◽  
J. C. Woicik ◽  
...  
Keyword(s):  
Light Source ◽  
Double Crystal ◽  
Double Crystal Monochromator ◽  
Advanced Light Source ◽  
And Performance

Kyushu University Beamline, BL06, at SAGA Light Source

2011 ◽  
Vol 1 (SRMS-7) ◽  
Author(s):  
S. Yoshioka ◽  
T. Ishioka ◽  
H. Okabe ◽  
A. Harata ◽  
Y. Sejima ◽  
...  
Keyword(s):  
Light Source ◽  
Focal Point ◽  
Fluorescence Yield ◽  
Photon Flux ◽  
Focal Distance ◽  
Double Crystal ◽  
X Ray ◽  
Xafs Spectroscopy ◽  
Ion Chamber ◽  
Double Crystal Monochromator

Kyushu University has installed the hard X-ray beamline, BL06, at bending magnet source of SAGA Light Source in Japan. It is designed for X-ray absorption fine structure (XAFS) spectroscopy and small-angle X-ray scattering (SAXS) experiments. The X-ray energy covered by the beamline ranges from 2.1 to 23 keV using a Si(111) flat double-crystal monochromator. Two bent cylindrical-type focusing mirrors are used, each with a different focal point. They are set in the optics section and can be used independently. One of the mirrors has a focal distance of 6 m, which corresponds to the sample stage for XAFS experiments, while the second mirror focuses at 10 m, corresponding to the detector for the SAXS experiments. The photon flux measured by the ion chamber at mirror focal point is 1010 phs/s. The experimental hutch houses the detection equipment for both XAFS and SAXS. For XAFS studies, a set of ion chambers for transmission mode and a Lytle detector and a Si drift detector for fluorescence yield mode are available. For SAXS studies, the camera pass length can be chosen from 0.5 to 2.5 m with 0.5 m increments in between, and an image plate is operated as signal detector. The beamline will be opened for user operation around summer 2010.

scholarly journals High‐resolution beamline 9.3.2 in the energy range 30–1500 eV at the Advanced Light Source: Design and performance

1996 ◽  
Vol 67 (9) ◽  
pp. 3372-3372 ◽  
Author(s):  
Z. Hussain ◽  
W.R.A. Huff ◽  
S.A. Kellar ◽  
E.J. Moler ◽  
P.A. Heimann ◽  
...  
Keyword(s):  
High Resolution ◽  
Energy Range ◽  
Light Source ◽  
Advanced Light Source ◽  
And Performance
Sign in / Sign up

Export Citation Format

Share Document