Negative‐ion production probability in rf plasma sputter‐type heavy negative‐ion sourcea)

1994 ◽  
Vol 65 (5) ◽  
pp. 1732-1736 ◽  
Author(s):  
Hiroshi Tsuji ◽  
Junzo Ishikawa ◽  
Yasuyuki Kawabata ◽  
Yasuhito Gotoh
Keyword(s):  
Negative Ion ◽  
Rf Plasma ◽  
Ion Production ◽  
Production Probability

Negative‐ion production probability in rf plasma sputter‐type heavy negative‐ion source (abstract)a)

1994 ◽  
Vol 65 (4) ◽  
pp. 1226-1226
Author(s):  
Hiroshi Tsuji ◽  
Junzo Ishikawa ◽  
Yasuyuki Kawabata ◽  
Yasuhito Gotoh
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Production ◽  
Production Probability

scholarly journals Negative-Ion Production of Gas Material in RF-Plasma Sputter-Type Heavy Negative-Ion Source.

Shinku ◽  
1995 ◽  
Vol 38 (3) ◽  
pp. 218-220
Author(s):  
Hiroshi TSUJI ◽  
Yoshio OKAYAMA ◽  
Yoshitaka TOYOTA ◽  
Yasuhito GOTOH ◽  
Junzo ISHIKAWA
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Production

Negative-Ion Implantation

1994 ◽  
Vol 354 ◽  
Author(s):  
Junzo Ishikawa
Keyword(s):  
Ion Implantation ◽  
Negative Ions ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Currents ◽  
Promising Technique ◽  
Surface Charging ◽  
Silicon Carbon ◽  
A Charge

AbstractNegative-ion implantation is a promising technique for forthcoming ULSI (more than 256 M bits) fabrication and TFT (for color LCD) fabrication, since the surface charging voltage of insulated electrodes or insulators implanted by negative ions is found to saturate within so few as several volts, no breakdown of insulators would be expected without a charge neutralizer in these fabrication processes. Scatter-less negative-ion implantation into powders is also possible. For this purpose an rf-plasma-sputter type heavy negative-ion source was developed, which can deliver several milliamperes of various kinds of negative ion currents such as boron, phosphor, silicon, carbon, copper, oxygen, etc. A medium current negative-ion implanter with a small version of this type of ion source has been developed.

Atomic wall recombination and volume negative ion production

2006 ◽  
Vol 77 (3) ◽  
pp. 03A505 ◽  
Author(s):  
Damiano Pagano ◽  
Claudine Gorse ◽  
Mario Capitelli
Keyword(s):  
Negative Ion ◽  
Ion Production

Compact surface plasma sources for heavy negative ion production

2004 ◽  
Vol 75 (5) ◽  
pp. 1732-1734 ◽  
Author(s):  
Vadim Dudnikov ◽  
J. Paul Farrell
Keyword(s):  
Compact Surface ◽  
Negative Ion ◽  
Surface Plasma ◽  
Plasma Sources ◽  
Ion Production

scholarly journals Efficient negative ion production in rf plasmas using a mesh grid bias method

2008 ◽  
Vol 79 (2) ◽  
pp. 02A502 ◽  
Author(s):  
Junichi Okada ◽  
Yuichi Nakao ◽  
Yasushi Tauchi ◽  
Osamu Fukumasa
Keyword(s):  
Negative Ion ◽  
Rf Plasmas ◽  
Ion Production ◽  
Mesh Grid

Monte Carlo simulation of negative ion production in the negative hydrogen ion source

2000 ◽  
Vol 71 (2) ◽  
pp. 883-886 ◽  
Author(s):  
M. Uematsu ◽  
T. Morishita ◽  
A. Hatayama ◽  
T. Sakurabayashi ◽  
M. Ogasawara
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Ion Source ◽  
Hydrogen Ion ◽  
Negative Ion ◽  
Ion Production ◽  
Negative Hydrogen Ion
Sign in / Sign up

Export Citation Format

Share Document