The computer simulation of an intense Cs0 beam source for a colliding‐beam polarized negative ion source

1992 ◽  
Vol 63 (4) ◽  
pp. 2640-2642
Author(s):  
Yusheng Rao ◽  
Youhao Xi ◽  
Boling Xi
1995 ◽  
Vol 396 ◽  
Author(s):  
Y. Park ◽  
Y.W. Ko ◽  
M.H. Sohn ◽  
S.I. Kim

AbstractA compact negative metal ion beam source for direct low energy metal ion beam depositions studies in ultra high vacuum (UHV) environment, has been developed. The ion source is based on SKION's Solid State Ion Beam Technology. The secondary negative metal ion beam is effectively produced by primary cesium positive ion bombardment (negative ion yield varies from 0.1-0.5 for carbon). The beam diameter is in the range of 0.2∼3.0 cm depending on the focusing and ion beam energy. The ion source produces negative ion currents of about 0.8 mA/cm2. The energy spread of the ion beam is less then ±5% of the ion beam energy. The energy of negative metal ion beam can be independently controlled in the range of 10-300 eV. Due to the complete solid state ion technology , the source can be operated while maintaining chamber pressures of less then 10-10 Torr.


2021 ◽  
Vol 166 ◽  
pp. 112266
Author(s):  
Lizhen Liang ◽  
Chundong Hu ◽  
Wei Liu ◽  
Jianglong Wei ◽  
Yongjian Xu ◽  
...  

2020 ◽  
Vol 91 (11) ◽  
pp. 113302
Author(s):  
H. Kaminaga ◽  
T. Takimoto ◽  
A. Tonegawa ◽  
K. N. Sato

2021 ◽  
Vol 169 ◽  
pp. 112424
Author(s):  
E. Sartori ◽  
M. Brombin ◽  
B. Laterza ◽  
M. Zuin ◽  
R. Cavazzana ◽  
...  
Keyword(s):  

1996 ◽  
Vol 67 (3) ◽  
pp. 1033-1035 ◽  
Author(s):  
Yu. Belchenko ◽  
C. Jacquot ◽  
J. Pamela ◽  
D. Riz
Keyword(s):  

1983 ◽  
Vol 4 (2P3) ◽  
pp. 1430-1435 ◽  
Author(s):  
W. K. Dagenhart ◽  
W. L. Gardner ◽  
W. L. Stirling ◽  
J. H. Whealton

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