scholarly journals Electrohydrodynamically driven, large‐area liquid metal ion source for inertial confinement fusion

1990 ◽  
Vol 61 (1) ◽  
pp. 571-573 ◽  
Author(s):  
Arian L. Pregenzer
2001 ◽  
Vol 19 (2) ◽  
pp. 309-316 ◽  
Author(s):  
KOICHI KASUYA ◽  
YOHSUKE KISHI ◽  
TAKAHIRO KAMIYA ◽  
MASATO FUNATSU

Medium-mass ion beams including nitrogen and oxygen were produced from a cryogenic diode with N2O ice as the ion source. The nominal diode voltage was 300–400 kV, and the peak ion current was 240 A. The beam divergence angle was measured with a five-aperture time-integrated pinhole camera. The five camera images were analyzed to estimate the spatial distribution of the beam source divergence angle along the anode radius, yielding a value of 5–6 mrad for the average microdivergence. This is low enough for this ion source to be studied further in the near future. If possible, we want to consider this as one of the probable candidate ion sources for ion beam drivers for future inertial confinement fusion (ICF) and inertial fusion energy (IFE) applications.


1989 ◽  
Vol 7 (4) ◽  
pp. 687-699 ◽  
Author(s):  
S. Miyamoto ◽  
K. Imasaki ◽  
Y. Yasuda ◽  
N. Yugami ◽  
T. Akiba ◽  
...  

Light ion beams for the energy drive for inertial confinement fusion (ICF) research have been studied on a super high voltage generation system (SHVS) using an inductive voltage adder system. A simple analysis implied the capability of the output voltage of several tens of MV. This system has a feasibility of acceleration of ions heavier than proton. The two-stage charge stripping ion diode is considered a SHVS diode. This diode reduces the size of the induction adder module and extends the possible power range in operation. We have constructed a prototype SHVS, which consists of eight stages of induction cavities (4MV, 40kA, 100ns) powered by a Reiden IV pulse power machine. The first ion diode experiments on the induction adder were performed with the beam extraction type ion diode (Br applied magnetic field). The injection plasma ion source was used to control the diode impedance and then the diode voltage. The time delay of ion current turn-on was reduced from 15–20 ns to less than 5 ns by this ion source.


Author(s):  
C. W. Price ◽  
E. F. Lindsey

Thickness measurements of thin films are performed by both energy-dispersive x-ray spectroscopy (EDS) and x-ray fluorescence (XRF). XRF can measure thicker films than EDS, and XRF measurements also have somewhat greater precision than EDS measurements. However, small components with curved or irregular shapes that are used for various applications in the the Inertial Confinement Fusion program at LLNL present geometrical problems that are not conducive to XRF analyses but may have only a minimal effect on EDS analyses. This work describes the development of an EDS technique to measure the thickness of electroless nickel deposits on gold substrates. Although elaborate correction techniques have been developed for thin-film measurements by x-ray analysis, the thickness of electroless nickel films can be dependent on the plating bath used. Therefore, standard calibration curves were established by correlating EDS data with thickness measurements that were obtained by contact profilometry.


1989 ◽  
Vol 50 (C8) ◽  
pp. C8-175-C8-177 ◽  
Author(s):  
N. M. MISKOVSKY ◽  
J. HE ◽  
P. H. CUTLER ◽  
M. CHUNG
Keyword(s):  

2020 ◽  
Vol 36 ◽  
pp. 100749 ◽  
Author(s):  
R.E. Olson ◽  
R.J. Leeper ◽  
S.H. Batha ◽  
R.R. Peterson ◽  
P.A. Bradley ◽  
...  

2021 ◽  
Vol 28 (3) ◽  
pp. 032713
Author(s):  
Dongguo Kang ◽  
Huasen Zhang ◽  
Shiyang Zou ◽  
Wudi Zheng ◽  
Shaoping Zhu ◽  
...  

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