Improved solid phase epitaxial growth of lithium tantalate thin films on sapphire, using a two‐step metalorganic chemical‐vapor deposition process

1993 ◽  
Vol 63 (19) ◽  
pp. 2649-2651 ◽  
Author(s):  
Alex A. Wernberg ◽  
Gabriel H. Braunstein ◽  
Henry J. Gysling
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Solid Phase ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Lithium Tantalate ◽  
Metalorganic Chemical

Solid‐phase epitaxial growth of lithium tantalate thin films deposited by spray‐metalorganic chemical vapor deposition

1993 ◽  
Vol 63 (3) ◽  
pp. 331-333 ◽  
Author(s):  
Alex A. Wernberg ◽  
Gabriel Braunstein ◽  
Gustavo Paz‐Pujalt ◽  
Henry J. Gysling ◽  
Thomas N. Blanton
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Solid Phase ◽  
Chemical Vapor ◽  
Lithium Tantalate ◽  
Metalorganic Chemical

Epitaxial growth of BaTiO3 thin films at 600 °C by metalorganic chemical vapor deposition

1995 ◽  
Vol 66 (21) ◽  
pp. 2801-2803 ◽  
Author(s):  
D. L. Kaiser ◽  
M. D. Vaudin ◽  
L. D. Rotter ◽  
Z. L. Wang ◽  
J. P. Cline ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Metalorganic Chemical

Epitaxial Growth of MgO-doped Lithium Niobate Thin Films by Metalorganic Chemical Vapor Deposition

2004 ◽  
Vol 43 (12) ◽  
pp. 8195-8198 ◽  
Author(s):  
Makoto Iwai ◽  
Makoto Ohmori ◽  
Takashi Yoshino ◽  
Shoichiro Yamaguchi ◽  
Minoru Imaeda
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Lithium Niobate ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Metalorganic Chemical

Epitaxial growth of SrTiO3 thin films by metalorganic chemical vapor deposition

1995 ◽  
Vol 66 (24) ◽  
pp. 3298-3300 ◽  
Author(s):  
S. R. Gilbert ◽  
B. W. Wessels ◽  
D. B. Studebaker ◽  
T. J. Marks
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Metalorganic Chemical

Epitaxial growth of few-layer β-In2Se3 thin films by metalorganic chemical vapor deposition

2020 ◽  
Vol 533 ◽  
pp. 125471 ◽  
Author(s):  
Xiaotian Zhang ◽  
Sora Lee ◽  
Anushka Bansal ◽  
Fu Zhang ◽  
Mauricio Terrones ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Metalorganic Chemical

A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur

2020 ◽  
Vol 49 (38) ◽  
pp. 13462-13474
Author(s):  
Jan-Lucas Wree ◽  
Engin Ciftyurek ◽  
David Zanders ◽  
Nils Boysen ◽  
Aleksander Kostka ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Elemental Sulfur ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
Metalorganic Chemical ◽  
Vapor Deposition Process

Crystalline MoS2 thin films are deposited via MOCVD using a new molybdenum precursor, 1,4-di-tert-butyl-1,4-diazabutadienyl-bis(tert-butylimido)molybdenum(vi) [Mo(NtBu)2(tBu2DAD)], and elemental sulfur.

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