High rate epitaxial growth of InP by merged hydride organometallic vapor phase epitaxy in a hot‐wall reactor

1993 ◽  
Vol 62 (2) ◽  
pp. 160-162 ◽  
Author(s):  
V. S. Ban ◽  
D. Rodefeld ◽  
J. R. Flemish ◽  
K. A. Jones
Keyword(s):  
Epitaxial Growth ◽  
Vapor Phase ◽  
Vapor Phase Epitaxy ◽  
High Rate ◽  
Organometallic Vapor Phase Epitaxy

Monocrystalline InN Films Grown at High Rate by Organometallic Vapor Phase Epitaxy with Nitrogen Plasma Activation Supported by Gyrotron Radiation

2013 ◽  
Vol 52 (11R) ◽  
pp. 110201 ◽  
Author(s):  
Alexander Vodopyanov ◽  
Yurii Buzynin ◽  
Dmitry Mansfeld ◽  
Oleg Khrykin ◽  
Yurii Drozdov ◽  
...  
Keyword(s):  
Vapor Phase ◽  
Nitrogen Plasma ◽  
Vapor Phase Epitaxy ◽  
High Rate ◽  
Organometallic Vapor Phase Epitaxy ◽  
Plasma Activation
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