Domain inversion in LiNbO3using direct electron‐beam writing

1992 ◽  
Vol 60 (23) ◽  
pp. 2828-2830 ◽  
Author(s):  
Alan C. G. Nutt ◽  
Venkatraman Gopalan ◽  
Mool C. Gupta
Keyword(s):  
Electron Beam ◽  
Domain Inversion

scholarly journals Two-dimensional structures of ferroelectric domain inversion in LiNbO3 by direct electron beam lithography

2003 ◽  
Vol 93 (12) ◽  
pp. 9943-9946 ◽  
Author(s):  
J. He ◽  
S. H. Tang ◽  
Y. Q. Qin ◽  
P. Dong ◽  
H. Z. Zhang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Ferroelectric Domain ◽  
Two Dimensional ◽  
Domain Inversion

Ferroelectric domain inversion by electron beam on LiNbO3 and Ti:LiNbO3

2000 ◽  
Vol 88 (11) ◽  
pp. 6665-6668 ◽  
Author(s):  
C. Restoin ◽  
C. Darraud-Taupiac ◽  
J. L. Decossas ◽  
J. C. Vareille ◽  
J. Hauden ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ferroelectric Domain ◽  
Domain Inversion

Nd3+ ion shift under domain inversion by electron beam writing in LiNbO3

2007 ◽  
Vol 90 (14) ◽  
pp. 141901 ◽  
Author(s):  
P. Molina ◽  
D. Sarkar ◽  
M. O. Ramírez ◽  
J. García Solé ◽  
L. E. Bausá ◽  
...  
Keyword(s):  
Electron Beam ◽  
Domain Inversion

Selective rearrangement ofNd3+centers inLiNbO3under ferroelectric domain inversion by electron beam writing

2008 ◽  
Vol 78 (1) ◽  
Author(s):  
P. Molina ◽  
M. O. Ramírez ◽  
J. García Solé ◽  
L. E. Bausá ◽  
B. J. García
Keyword(s):  
Electron Beam ◽  
Ferroelectric Domain ◽  
Domain Inversion

Fabrication of Two-dimensional Nonlinear Photonic Crystal by Electron Beam Lithography

2003 ◽  
Vol 797 ◽  
Author(s):  
Chiang Huen Kang ◽  
Ze Xiang Shen ◽  
Sing Hai Tang
Keyword(s):  
Electron Beam ◽  
Photonic Crystal ◽  
Electron Beam Lithography ◽  
Electrostatic Force ◽  
Frequency Doubling ◽  
Uniform Domain ◽  
Two Dimensional ◽  
Force Microscopy ◽  
Nonlinear Photonic Crystal ◽  
Domain Inversion

ABSTRACTIn this paper, we present a study on quasi-phase matched (QPM) two-dimensional χ(2) lithium niobate (LN) nonlinear photonic crystal (NPC) for frequency doubling at λ = 1064nm. The NPCs were fabricated by electron beam lithography (EBL) through periodic polarization inversion of the ferroelectric domains and characterized with electrostatic force microscopy (EFM), atomic force microscopy and optical microscopy. Domain inversion occurred through the entire wafer thickness of 0.5mm as EFM images on the +c face of the z-cut wafer showed uniform domain structures throughout the corresponding electron beam irradiated regions of the -c face. In addition, the intended periodicity was observed. Moreover, domain inversion was also seen to have taken place in bulk from the optical images of the chemically etched samples. The EBL technique offers great flexibility in superlattice design and relative ease of fabrication as compared to the conventional poling techniques as pattern transfer is direct without the need for a mask and/or a coating of resist. Besides, micro- or sub-micro scale superlattices corresponding to wavelengths in the visible and into the ultraviolet are highly feasible, restricted only by the transparency of the crystals.

Domain inversion in KTiOPO4using electron beam scanning

1993 ◽  
Vol 63 (9) ◽  
pp. 1167-1169 ◽  
Author(s):  
Mool C. Gupta ◽  
W. P. Risk ◽  
Alan C. G. Nutt ◽  
S. D. Lau
Keyword(s):  
Electron Beam ◽  
Beam Scanning ◽  
Domain Inversion
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