High‐quality YBa2Cu3O7−xthin films by plasma‐enhanced metalorganic chemical vapor deposition at low temperature

J. Zhao; Y. Q. Li; C. S. Chern; P. Lu; P. Norris; B. Gallois; B. Kear; F. Cosandey; X. D. Wu; R. E. Muenchausen; S. M. Garrison

doi:10.1063/1.105468

High‐quality YBa2Cu3O7−xthin films by plasma‐enhanced metalorganic chemical vapor deposition at low temperature

Applied Physics Letters ◽

10.1063/1.105468 ◽

1991 ◽

Vol 59 (10) ◽

pp. 1254-1256 ◽

Cited By ~ 34

Author(s):

J. Zhao ◽

Y. Q. Li ◽

C. S. Chern ◽

P. Lu ◽

P. Norris ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Metalorganic Chemical

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High quality low-temperature GaAs film grown by conventional metalorganic chemical vapor deposition

10.1109/edms.1994.771209 ◽

2005 ◽

Author(s):

Wei-Kuo Chen

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Gaas Film ◽

High Quality ◽

Low Temperature Gaas ◽

Metalorganic Chemical

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High quality low-temperature GaAs film grown by conventional metalorganic chemical vapor deposition

10.1109/edms.1994.863788 ◽

2005 ◽

Author(s):

Wei-Kuo Chen

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Gaas Film ◽

High Quality ◽

Low Temperature Gaas ◽

Metalorganic Chemical

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High quality undopedn‐type GaSb epilayers by low‐temperature metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.354643 ◽

1993 ◽

Vol 74 (4) ◽

pp. 2892-2895 ◽

Cited By ~ 7

Author(s):

S. M. Chen ◽

Y. K. Su

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Metalorganic Chemical

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Structural and electrical properties of BaTiO3thin films grown onp‐InSb substrate by metalorganic chemical vapor deposition at low temperature

Applied Physics Letters ◽

10.1063/1.109550 ◽

1993 ◽

Vol 62 (15) ◽

pp. 1788-1790 ◽

Cited By ~ 16

Author(s):

T. W. Kim ◽

M. Jung ◽

H. J. Kim ◽

Y. S. Yoon ◽

W. N. Kang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Structural And Electrical Properties ◽

Metalorganic Chemical

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High speed metal‐semiconductor‐metal photodetector manufactured on GaAs by low‐temperature photoassisted metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114129 ◽

1995 ◽

Vol 66 (26) ◽

pp. 3651-3653 ◽

Cited By ~ 3

Author(s):

K. S. Boutros ◽

J. C. Roberts ◽

S. M. Bedair ◽

T. F. Carruthers ◽

M. Y. Frankel

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

High Speed ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metal Semiconductor Metal ◽

Metalorganic Chemical

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High‐quality GaInAsP/InP heterostructures grown by low‐pressure metalorganic chemical vapor deposition on silicon substrates

Applied Physics Letters ◽

10.1063/1.99521 ◽

1988 ◽

Vol 52 (3) ◽

pp. 209-211 ◽

Cited By ~ 28

Author(s):

M. Razeghi ◽

F. Omnes ◽

M. Defour ◽

Ph. Maurel

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Substrates ◽

High Quality ◽

Metalorganic Chemical

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Low Temperature Fabrication Of YBa2Cu3O7−x High-Tc Superconducting Thin Films By Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Science and Technology of Thin Film Superconductors 2 ◽

10.1007/978-1-4684-1345-8_32 ◽

1990 ◽

pp. 217-222

Author(s):

J. Zhao ◽

D. W. Noh ◽

C. S. Chern ◽

Y. Q. Li ◽

P. Norris ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

High Tc ◽

Metalorganic Chemical

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High Quality GaN Layers Grown on SiC Substrates with AlN Buffers by Metalorganic Chemical Vapor Deposition

Chinese Journal of Luminescence ◽

10.3788/fgxb20113209.0896 ◽

2011 ◽

Vol 32 (9) ◽

pp. 896-901 ◽

Cited By ~ 1

Author(s):

陈耀 CHEN Yao ◽

王文新 WANG Wen-xin ◽

黎艳 LI Yan ◽

江洋 JIANG Yang ◽

徐培强 XU Pei-qiang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Metalorganic Chemical

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Low-pressure metalorganic chemical vapor deposition of high-quality AlN and GaN thin films on sapphire and silicon substrates

10.1117/12.206881 ◽

1995 ◽

Cited By ~ 2

Author(s):

Patrick Kung ◽

Xiaolong Zhang ◽

Erwan Bigan ◽

Manijeh Razeghi ◽

Adam W. Saxler

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Substrates ◽

High Quality ◽

Metalorganic Chemical

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Hydrogen beam stimulated low‐temperature dissociation of organometallics—application for lowering the growth temperature in a metalorganic chemical vapor deposition process

Applied Physics Letters ◽

10.1063/1.103004 ◽

1990 ◽

Vol 56 (20) ◽

pp. 2019-2021 ◽

Cited By ~ 4

Author(s):

G. V. Jagannathan ◽

Merrill L. Andrews ◽

Alec T. Habig

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Growth Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Hydrogen Beam ◽

Metalorganic Chemical

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