X‐ray photoemission and Raman scattering spectroscopic study of surface modifications of silicon induced by electron cyclotron resonance etching

A. S. Yapsir; G. S. Oehrlein; G. Fortuño‐Wiltshire; J. C. Tsang

doi:10.1063/1.103607

X‐ray photoemission and Raman scattering spectroscopic study of surface modifications of silicon induced by electron cyclotron resonance etching

Applied Physics Letters ◽

10.1063/1.103607 ◽

1990 ◽

Vol 57 (6) ◽

pp. 590-592 ◽

Cited By ~ 6

Author(s):

A. S. Yapsir ◽

G. S. Oehrlein ◽

G. Fortuño‐Wiltshire ◽

J. C. Tsang

Keyword(s):

Raman Scattering ◽

Spectroscopic Study ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Surface Modifications ◽

Electron Cyclotron ◽

X Ray

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X-ray photoelectron diffraction observation of β-SiC(001) obtained by electron cyclotron resonance plasma assisted growth on Si(001)

Applied Surface Science ◽

10.1016/0169-4332(93)90239-8 ◽

1993 ◽

Vol 68 (4) ◽

pp. 575-582 ◽

Cited By ~ 20

Author(s):

M. Diani ◽

J.L. Bischoff ◽

L. Kubler ◽

D. Bolmont

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Photoelectron Diffraction ◽

Resonance Plasma

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Experimental studies on a compact electron cyclotron resonance plasma x-ray source

Review of Scientific Instruments ◽

10.1063/1.1149821 ◽

1999 ◽

Vol 70 (6) ◽

pp. 2637-2645 ◽

Cited By ~ 15

Author(s):

R. Baskaran ◽

T. S. Selvakumaran

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Experimental Studies ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Resonance Plasma

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SiC x-ray lithography mask fabricated by electron cyclotron resonance plasma source coupled with divided microwaves

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589378 ◽

1997 ◽

Vol 15 (3) ◽

pp. 736 ◽

Cited By ~ 2

Author(s):

Masaru Shimada

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Resonance Plasma

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Measurement of ion charge state distributions inside electron cyclotron resonance neon and chlorine plasmas by x-ray spectroscopy (abstract)

Review of Scientific Instruments ◽

10.1063/1.1149228 ◽

1998 ◽

Vol 69 (2) ◽

pp. 1203-1203

Author(s):

P. Grübling ◽

D. Küchler ◽

A. Ullrich ◽

T. Werner ◽

G. Zschornack

Keyword(s):

Charge State ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

X Ray ◽

Charge State Distributions

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Maximum x-ray energy from compact electron cyclotron resonance based source of x rays

Review of Scientific Instruments ◽

10.1063/1.1480456 ◽

2002 ◽

Vol 73 (6) ◽

pp. 2287-2291 ◽

Cited By ~ 10

Author(s):

C. Rouillé ◽

K. Serebrennikov ◽

M. Bacal

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

X Rays ◽

X Ray

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Ultrahigh-Vacuum Electron Cyclotron Resonance-Plasma Chemical-Vapor-DepositedSiNxFilms for X-Ray Lithography Mask Membrane: As-Deposited Properties and Radiation Stability

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.6908 ◽

1994 ◽

Vol 33 (Part 1, No. 12B) ◽

pp. 6908-6912 ◽

Cited By ~ 1

Author(s):

Jinho Ahn ◽

Katsumi Suzuki ◽

Shinji Tsuboi ◽

Yoshio Yamashita

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Radiation Stability ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Resonance Plasma

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Pulse height analysis using Si-pin diode of x-ray irradiated from a 2.45 GHz electron cyclotron resonance multicharged ion source

Review of Scientific Instruments ◽

10.1063/1.1148659 ◽

1998 ◽

Vol 69 (2) ◽

pp. 1179-1181 ◽

Cited By ~ 10

Author(s):

Yushi Kato ◽

Yoshiyuki Kubo ◽

Shigeyuki Ishii

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Pulse Height ◽

Ion Source ◽

Electron Cyclotron ◽

Pin Diode ◽

X Ray ◽

Pulse Height Analysis

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A photoconductivity and Raman scattering analysis of boron-doped a-SiC:H films deposited using the electron cyclotron resonance plasma CVD method

ICSE '96. 1996 IEEE International Conference on Semiconductor Electronics. Proceedings ◽

10.1109/smelec.1996.616482 ◽

2002 ◽

Author(s):

S.F. Yoon ◽

R. Ji ◽

J. Ahn ◽

W.I. Milne

Keyword(s):

Raman Scattering ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Cvd ◽

Electron Cyclotron Resonance Plasma ◽

Cvd Method ◽

Boron Doped ◽

Resonance Plasma

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X‐ray and vacuum ultraviolet imaging for electron cyclotron resonance processing plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578491 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1186-1192 ◽

Cited By ~ 3

Author(s):

K. H. Chew ◽

J. L. Shohet ◽

T. J. Castagna ◽

K. L. Seaward ◽

F. F. Mertz

Keyword(s):

Cyclotron Resonance ◽

Vacuum Ultraviolet ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

X Ray

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Two-slope soft X-ray spectra observed in experiments on electron cyclotron resonance plasma heating in the L-2M stellarator

Plasma Physics Reports ◽

10.1134/s1063780x17060113 ◽

2017 ◽

Vol 43 (6) ◽

pp. 599-604 ◽

Cited By ~ 5

Author(s):

A. I. Meshcheryakov ◽

I. Yu. Vafin ◽

I. A. Grishina ◽

A. A. Letunov ◽

M. A. Tereshchenko

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Heating ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Resonance Plasma

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